High temperature pressure sensor technology based on heavy doping 4H-SiC substrate
A pressure sensor and heavy doping technology, which is applied to the measurement of the property and force of piezoelectric resistance materials, electric solid-state devices, semiconductor devices, etc., and can solve the problems of incomplete varieties and low output.
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[0007] Below in conjunction with accompanying drawing and embodiment the present invention will be further described
[0008] A kind of preparation process of the high-temperature pressure sensor based on heavily doped 4H-SiC substrate described in the present invention, especially n-type heavily doped 4H-SiC substrate (such as figure 1 shown), including the following steps:
[0009] Step 1, preparing a 4H-SiC substrate: the substrate is a SiC wafer, polished on both sides, and cleaned by RCA.
[0010] Step 2, preparation of piezoresistive strips: pattern the substrate by photolithography, magnetron sputtering Ni, peel off the photoresist to realize pattern transfer, RIE (reactive ion etching) shallow etching of 2 μm, soak in Ni corrosion solution 10min, rinse with deionized water, N 2 blow dry.
[0011] Step 3, prepare the seed layer: use photolithography to pattern the substrate, use ultra-high vacuum magnetron sputtering equipment, radio frequency target position, 75W, 2...
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