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Method for concentrating processing waste liquid and method for recycling processing waste liquid

A developer solution and waste solution technology, which is applied in waste paint treatment, water/sewage treatment, natural water body treatment, etc., can solve the problems of large sites for waste treatment equipment, and achieve excellent ink retention, without reducing the development speed, and durability Excellent staining effect

Active Publication Date: 2015-03-04
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, a huge space is required to store waste liquid before waste liquid treatment
In addition, the waste liquid treatment facility has problems such as requiring a considerable space

Method used

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  • Method for concentrating processing waste liquid and method for recycling processing waste liquid
  • Method for concentrating processing waste liquid and method for recycling processing waste liquid
  • Method for concentrating processing waste liquid and method for recycling processing waste liquid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～9、 comparative example 1～7

[0453] [I] Production of the original lithographic printing plate (1)

[0454] (1) Production of support body

[0455] In order to remove rolling oil on the surface of an aluminum plate with a thickness of 0.3 mm (JIS A1050 with an Al content of 99.5% by mass or more), degreasing treatment was performed at 50° C. for 30 seconds using a 10% by mass sodium aluminate aqueous solution. Then, use 3 bundles of brushes with nylon hairs with a diameter of 0.3 mm and a pumice-water suspension with a median particle size of 25 μm (specific gravity 1.1 g / cm 3 ) Scrub the surface of the aluminum plate and wash it thoroughly with water. This board was immersed in 25 mass % sodium hydroxide aqueous solution at 45 degreeC for 9 seconds for etching, and after washing with water, it was further immersed in 20 mass % of nitric acid at 60 degreeC for 20 seconds, and it washed with water. The amount of etching on the frosted surface at this time is about 3g / m 2 .

[0456] Next, electrochemica...

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Abstract

This method for concentrating processing waste liquid includes a step in which waste liquid produced by developing lithographic printing plates with a developer is obtained after exposure. The lithographic printing plate has, on a substrate, an image recording layer containing an infrared-absorbing dye, a polymerization initiator and a polymerizable compound on a substrate, and a protective layer. The developer: contains 1 mass% to 10 mass% of an anionic surfactant having a naphthalene skeleton and / or a nonionic surfactant having a naphthalene skeleton; contains 2 mass% or less of an organic solvent with a boiling point of 100 DEG C to 300 DEG C; and a pH of 6.0 to 9.5. This method for concentrating processing waste liquid further includes a step in which the waste liquid is concentrated through evaporation in such a manner that the ratio of the quantity of the processing waste liquid after concentration to the quantity of processing waste liquid before concentration is 1 / 2 to 1 / 10 on a volume basis.

Description

technical field [0001] The present invention relates to a method for concentrating and recycling waste liquid in developing process generated when developing photosensitive lithographic printing original plate by automatic developing machine. Background technique [0002] In the past, in the case of using an automatic developing machine to develop a photosensitive lithographic printing plate precursor, in order to keep the concentration and pH of components lost due to processing or over time constant, and to maintain the performance of the developing solution, the development replenishing solution was supplied. Into the developer solution of each process. Even if such replenishment is performed, if the performance of the developer exceeds the allowable limit, all the developer will be discarded. [0003] The usual plate-making waste liquid is a highly alkaline liquid. However, as a planographic printing plate precursor, a so-called process-free planographic printing plate ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32C02F1/04G03F7/00G03F7/004G03F7/11
CPCG03F7/32B41C2201/14C02F1/048C02F2209/06G03F7/027C02F2103/14G03F7/322B41C1/1016C02F2209/02B41C2201/02G03F7/3092C02F2103/40
Inventor 割石幸司小林史和森崇德
Owner FUJIFILM CORP
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