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894results about How to "Avoid foaming" patented technology

Method for treating coal gasification wastewater containing phenol and ammonia

InactiveCN101597124AEffective removal of fixed ammonia contentMeet the requirements of subsequent biochemical treatmentMultistage water/sewage treatmentWater/sewage treatment by degassingCoal gasification wastewaterHigh concentration
The invention relates to a method for treating coal gasification wastewater containing phenol and ammonia. The method comprises the following steps: single tower alkali injection and pressurization steam stripping removal of acidic gas and ammonia, three-level dephlegmation of lateral line tapped gas, extraction of phenol by diisopropyl ether and solvent recovery. The cold and hot coal gasification wastewater, according to a certain proportion, respectively enters a pressurization single tower from the upper part and middle upper part of a wastewater steam stripping tower, and acid gas is discharged from the tower top; the lateral line withdrawal mixed gas goes through three-level dephlegmation to obtain high-concentration ammonia, alkali is injected at the position below the lateral line to transform fixed ammonia into free ammonia which is to be removed; counter-current extraction is carried out on removed ammonia, residue of acid gas and diisopropyl ether to dephenolize; extraction solvent is recovered by a solvent recovery tower and a solvent steam stripping tower to obtain the byproduct, namely crude phenol. In the method of the invention, the process removing acid gas, free ammonia and fixed ammonia is carried out simultaneously on the coal gasification wastewater in the wastewater steam stripping single tower, as a result, high-concentration ammonia is obtained, the content of carbon dioxide, sulfureted hydrogen, free ammonia and fixed ammonia in tower kettle purified water is extremely low, encrustment is not prone to take place, and the purified coal gasification wastewater meets the requirement of follow-up biochemical treatment.
Owner:SOUTH CHINA UNIV OF TECH +2

Magenta ink composition, ink set, ink cartridge, inkjet recording method and recorded product

A magenta ink composition used as a colorant, containing at least one type of compound represented by Formula (I) below and at least one type of compound represented by Formula (II) below:(wherein A represents the residue of the five member heterocyclic diazo moiety A-NH2; B1 and B2 represent —CR1═ and —CR2═, or one represents a nitrogen atom, and the other represents —CR1═ or —CR2═; R5 and R6 each independently represents a hydrogen atom, aliphatic group, aromatic group, heterocyclic group, acyl group, alkoxy carbonyl group, aryloxy carbonyl group, carbamoyl group, alkyl sulfonyl group, aryl sulfonyl group, or sulfamoyl group, each group therein being optionally substituted; G, R1 and R2 each independently represents a hydrogen atom, halogen atom, aliphatic group, aromatic group, heterocyclic group, cyano group, carboxyl group, carbamoyl group, alkoxycarbonyl group, aryloxy carbonyl group, acyl group, hydroxyl group, alkoxy group, aryloxy group, silyloxy group, acyloxy group, carbamoyloxy group, heterooxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino group substituted with an alkyl group or aryl group or heterocyclic group, acylamino group, ureide group, sulfamoylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, alkyl and aryl sulphonylamino group, aryloxycarbonylamino group, nitro group, alkyl and aryl thio group, alkyl and aryl sulfonyl group, alkyl and aryl sulfinyl group, sulfamoyl group, sulfo group, or heterothio group, each group therein being optionally substituted; and R1 and R5, or R1 and R5 may optionally bond together to form a 5 or 6 member ring);(wherein M represents a hydrogen atom, ammonium group, or alkali metal atom; X represents a diaminoalkylene group; and n represents either 1 or 2).
Owner:SEIKO EPSON CORP

Magenta ink composition, ink set, ink cartridge, inkjet recording method and recorded product

A magenta ink composition used as a colorant, containing at least one type of compound represented by Formula (I) below and at least one type of compound represented by Formula (II) below: (wherein A represents the residue of the five member heterocyclic diazo moiety A-NH2; B1 and B2 represent —CR1═ and —CR2═, or one represents a nitrogen atom, and the other represents —CR1═ or —CR2═; R5 and R6 each independently represents a hydrogen atom, aliphatic group, aromatic group, heterocyclic group, acyl group, alkoxy carbonyl group, aryloxy carbonyl group, carbamoyl group, alkyl sulfonyl group, aryl sulfonyl group, or sulfamoyl group, each group therein being optionally substituted; G, R1 and R2 each independently represents a hydrogen atom, halogen atom, aliphatic group, aromatic group, heterocyclic group, cyano group, carboxyl group, carbamoyl group, alkoxycarbonyl group, aryloxy carbonyl group, acyl group, hydroxyl group, alkoxy group, aryloxy group, silyloxy group, acyloxy group, carbamoyloxy group, heterooxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino group substituted with an alkyl group or aryl group or heterocyclic group, acylamino group, ureide group, sulfamoylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, alkyl and aryl sulphonylamino group, aryloxycarbonylamino group, nitro group, alkyl and aryl thio group, alkyl and aryl sulfonyl group, alkyl and aryl sulfinyl group, sulfamoyl group, sulfo group, or heterothio group, each group therein being optionally substituted; and R1 and R5, or R1 and R5 may optionally bond together to form a 5 or 6 member ring); (wherein M represents a hydrogen atom, ammonium group, or alkali metal atom; X represents a diaminoalkylene group; and n represents either 1 or 2).
Owner:SEIKO EPSON CORP

Atomic layer deposition processes

This invention relates to method of forming a thin film on a substrate in a reaction chamber by an atomic layer deposition process comprising a plurality of individual cycles. The plurality of individual cycles comprise at least two groupings of individual cycles. The individual cycles comprise (i) introducing a gaseous metal containing precursor into the reaction chamber and exposing the substrate to the gaseous metal containing precursor, wherein at least a portion of the metal containing precursor is chemisorbed onto the surface of the substrate to form a monolayer thereon, (ii) stopping introduction of the metal containing precursor and purging the volume of the reaction chamber; (iii) introducing a gaseous oxygen source compound into the reaction chamber and exposing the monolayer to the gaseous oxygen source compound, wherein at least a portion of the oxygen source compound chemically reacts with the monolayer; and (iv) stopping introduction of the oxygen source compound and purging the volume of the reaction chamber. The method involves repeating the individual cycles until a thin film of desired thickness is obtained. The method also involves carrying out at least two groupings of individual cycles at different process conditions. The methods are useful for producing a thin film on a semiconductor substrate, particularly metal containing thin films for electrode applications in microelectronics.
Owner:PRAXAIR TECH INC

Method for processing island ultra-thin fiber high-density needling non-woven fabrics emulation leather

The invention relates to a method for machining an island superfine fiber high density pinprick non-woven fabrics artificial leather, which is applied to the artificial leather manufacture and comprises the following processes: (1) the foundation process; (2) the PU wet method dipping process; (3) the continuous alkali abatement fiber opening process; (4) the pigmentation, the flexible tentering and shaping, the peached finish on two sides by a roughing-up machine; (5) the post treatments such as the dry method facing. The method is characterized in that the following processes are performed between the (4) process and the (5) process which are as follows: (6) the rolling blanching at a high temperature of 80 to 120 DEG C; (7) the high concentration polyurethane DMF solution with a weight ratio of PU: DMF of 100:50-93 is coated on the single side of the fabrics; (8) the time delay of 30 to 80 seconds; (9) a low temperature of 10 to 15 DEG C high concentration of 15 to 25 percent of DMF solution coagulating basin is coagulated, washed by water, dried and wrapped up. The method has the advantages that the manufactured finished leather has even thickness, excellent anti-tear strength and good ventilation property, the shortcoming that the cross breaks of the fibril synthetic leather is concave is overcome; the single spreading effectively avoids the foaming phenomenon on the coating surface; the section color is constant, etc.
Owner:NANPING JINYUE ARTIFICIAL LEATHER

Furniture wood surface spraying equipment

The invention relates to the technical field of wood spraying devices and discloses furniture wood surface spraying equipment. The furniture wood surface spraying equipment comprises an equipment body; the inner top wall of the equipment body is fixedly connected with a mobile device; a spraying device is fixedly installed at the inner top wall of the equipment body; a swing device and a bracket are movably and fixedly installed from left to right at the inner bottom wall of the equipment body; the top of the bracket is hinged with a placing plate through a bolt pin; two symmetric clamping devices are fixedly installed at the top of the placing plate; a fan is fixedly installed at the left side surface of the equipment body; and an air outlet of the fan communicates with an air guide pipe.The furniture wood surface spraying equipment provided by the invention solves the problems that a traditional spraying method is low in efficiency and affects the body health of a worker, bubbles are easily generated in the sprayed paint surface, the quality is poor and the drying time is long; and the furniture wood surface spraying equipment achieves the effects of being high in spraying efficiency, preventing generation of bubbles and adsorption of dust after spraying and simultaneously protecting the body health of the worker.
Owner:汪永平
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