Solar cell back electrode passivation layer preparation technology based on surface oxidation method
A technology of surface oxidation and back electrode, which is applied in the field of solar cells, can solve the problems of high deposition energy of Mo thin films and affect the quality of the battery interface, and achieve the effect of improving the combination
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[0019] Experimental example
[0020] 1. Put the cleaned substrate into the vacuum chamber of the magnetron sputtering equipment, the background vacuum to be DC sputtered is 3-9E-7mTorr, and start to run the magnetron sputtering process to deposit Mo thin film and prepare the substrate buffer layer (2). The Mo buffer layer (2) is deposited at a pressure of 8-12 mTorr and a power of 200-400 W to a thickness of 50-500 nm.
[0021] 2. On the basis of the buffer layer, the process parameters are changed, and the Mo conductive layer (3) with a thickness of 100-1000 nm is continuously deposited.
[0022] 3. After the conductive layer (3) reaches the required thickness, change the working gas to a mixed gas of argon and oxygen, and the oxygen flow rate is 10-50% of that of argon. A Mo passivation layer doped with MoO2 with a thickness of 30-200 nm is deposited (4).
[0023] This composite electrode has good adhesion to the substrate, and its sheet resistance figure 2 ).
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