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Preparation process for high-silicon super-hard PVD coating

A preparation process and coating technology, which is applied in the field of PVD technology to prepare high-silicon superhard coatings, can solve the problems of intolerable bonding force between the coating and the tool substrate, unsatisfactory effects, strong impact, etc., to alleviate the hardness of the coating. Contradictions with the coefficient of friction, reducing internal stress, and reducing wear

Inactive Publication Date: 2015-05-06
SHANGHAI INST OF TECH
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  • Summary
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  • Claims
  • Application Information

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Problems solved by technology

[0004] Although most of the coatings prepared by the original process have high hardness, toughness and high temperature stability, they have also been applied in the field of tool processing, but the bonding force between the coating and the tool substrate cannot withstand strong impact. Unsatisfactory results in the field of high-speed and high-hardness cutting

Method used

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Embodiment Construction

[0037] The high-silicon superhard PVD coating preparation process of the present invention uses a PVD coating equipment model of ICS-04 ARC PRO, and the specific operation includes the following steps: (1) pretreatment of the workpiece surface; (2) clamping and loading of the workpiece ; (3) Vacuumize the furnace cavity; (4) Heating the workpiece; (5) Etching and cleaning the target and workpiece; (6) Preparation of high silicon coating; (7) Cooling of the workpiece. The invention obtains a high-silicon super-hard PVD coating with a certain element ratio by controlling the vacuum degree of the coating furnace cavity, the bias voltage of the substrate, the flow rate of nitrogen gas, and the target current. Reactive gas Nitrogen (N 2 ) flow range is 130-210sccm, substrate bias range is 40-120V, furnace chamber vacuum range is 0.005-0.060mbar. By changing the composition of the coating elements, a high silicon content is obtained, so that the coating has higher strength, hardnes...

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Abstract

The invention provides a preparation process for a high-silicon super-hard PVD coating. The preparation process comprises the following steps: I, pre-processing a workpiece surface; II, clamping and loading a workpiece; III, performing vacuum-pumping on a furnace chamber; IV, heating the workpiece; V, etching and cleaning a target material and the workpiece; VI, preparing a high-silicon coating; VII, cooling the workpiece. The preparation process is used for obtaining the high-silicon super-hard PVD coating by controlling vacuum degree of a film-coating furnace chamber, bias voltage of a base body, a flow rate of nitrogen gas, target current and the like, wherein the flow rate of the reaction gas nitrogen gas (N2) ranges from 130 sccm to 210 sccm, the bias voltage of the base body ranges from 40 V to 120 V, and the vacuum degree of the furnace chamber ranges from 0.005 mbar to 0.060 mbar. By changing the element components of the coating, high silicon element content is obtained, so that the coating has characteristics of relatively high strength, hardness, wear resistance, high-temperature stability and corrosion resistance. A coating tool prepared by the process can be used for cutting a material with hardness of HRC65, and has relatively good using performances in comparison with a conventional coating.

Description

technical field [0001] The invention relates to a process for preparing a high-silicon superhard coating by PVD technology. Background technique [0002] PVD technology is a new coating preparation technology developed in recent decades, and has been widely used in the fields of cutting tools, molds, aerospace, medical equipment, solar cells and microelectronics. This coating technology can endow the workpiece with high hardness, wear resistance, toughness, corrosion resistance and high temperature resistance, and has very good application prospects. However, with the development of material technology, the cutting performance requirements of metals are constantly improving. In order to meet the requirements, people need to develop and apply new coating processes and coating materials. [0003] Since PVD is a low-temperature, vacuum coating preparation technology, it has a wide range of applications. It can deposit hard films of various compounds, so as the coating technol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/02
Inventor 张而耕陈强张体波王琴雪
Owner SHANGHAI INST OF TECH
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