Preparation process for high-silicon super-hard PVD coating
A preparation process and coating technology, which is applied in the field of PVD technology to prepare high-silicon superhard coatings, can solve the problems of intolerable bonding force between the coating and the tool substrate, unsatisfactory effects, strong impact, etc., to alleviate the hardness of the coating. Contradictions with the coefficient of friction, reducing internal stress, and reducing wear
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[0037] The high-silicon superhard PVD coating preparation process of the present invention uses a PVD coating equipment model of ICS-04 ARC PRO, and the specific operation includes the following steps: (1) pretreatment of the workpiece surface; (2) clamping and loading of the workpiece ; (3) Vacuumize the furnace cavity; (4) Heating the workpiece; (5) Etching and cleaning the target and workpiece; (6) Preparation of high silicon coating; (7) Cooling of the workpiece. The invention obtains a high-silicon super-hard PVD coating with a certain element ratio by controlling the vacuum degree of the coating furnace cavity, the bias voltage of the substrate, the flow rate of nitrogen gas, and the target current. Reactive gas Nitrogen (N 2 ) flow range is 130-210sccm, substrate bias range is 40-120V, furnace chamber vacuum range is 0.005-0.060mbar. By changing the composition of the coating elements, a high silicon content is obtained, so that the coating has higher strength, hardnes...
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