Compound active additive and applications thereof

Abstract

The invention relates to a compound active additive and applications thereof. The compound active additive is a mixture composed of 50 to 75% of quaternary ammonium salt (A), 15 to 30% of imidazole (B), and 10 to 20% of azine (C). The provided compound active additive is used to deeply remove acidic components from acidic natural gas containing carbon dioxide and organic sulfur. The active additive is compounded with an alcohol-amine solvent before using, the addition amount of the additive is 1 to 10% of the solvent weight, the pH of the mixture is 11 to 12 at a temperature of 25 DEG C, and the final kinematic viscosity is 20 to 30 m2/s. The active additive can deeply remove hydrogen sulfide, carbon dioxide, and organic sulfur. The hydrogen sulfide content is less than 3 mg/m3, the carbon dioxide content is less than 50 mg/m3, and the organic sulfur content is less than 50 mg/m3 after application of the active additive. At the same time, the anticorrosive and antifoaming properties of alcohol-amine solvent are improved, and the thermal stability and chemical stability of the alcohol-amine solvent are not affected.

Description

Technical field: [0001] The invention belongs to the technical field of gas processing, and more specifically relates to 2 S, CO 2 A large amount or even deep removal of H from the gas with organic sulfur 2 S, CO 2 And organic sulfur, and make it meet my country's LNG liquefaction standards. Background technique: [0002] The Sulfinol series desulfurization technology owned by the British-Dutch Shell company, in which Sulfinol-D and Sulfinol-X can be used for deep removal of H 2 S, CO 2 And organic sulfur, these two types of solvents are physical and chemical solvents, and the deep removal effect of Sulfinol-X is better than that of Sulfinol-D. Its main components are methyldiethanolamine and sulfolane, and the active component piperazine is added. Can meet H 2 S, CO 2 And the pretreatment of LNG gas with low organic sulfur content. [0003] Patent WO2005069965 discloses a method for removing hydrogen sulfide, carbon dioxide and COS in gas. The patent states that a c...

AI Technical Summary

Problems solved by technology

[0005] Although the above methods can realize the H 2 S, CO 2 and a large amount of organic sulfur removal, but in the actual operation process, the gas-liquid ratio of the absorption process needs to be adjusted to a smaller range, and the economy is poor

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