Preparation method of super-hydrophobic self-cleaning glass based on ZnO nano array coating
A nano-array and nano-rod array technology is applied in the field of preparation of superhydrophobic self-cleaning glass, which can solve the problems of cluttered light environment, damage to urban landscape, loss of original characteristics, etc. Band width effect
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[0028] Example 1
[0029] 1. Process parameters for preparing ZnO seed layer sol: 0.3mol / L ZnO seed layer sol was prepared by sol-gel method, using zinc acetate as precursor, monoethanolamine as complexing agent, and ethylene glycol methyl ether as solvent.
[0030] 2. The process parameters for preparing the ZnO seed layer: Immerse the ITO glass substrate in the prepared ZnO sol for 20s to make the sol fully contact the surface of the ITO glass substrate, and then vertically pull the ITO glass at a speed of 6cm / min The substrate and the wet film were moved into a 100°C incubator for drying treatment for 20min, repeated once, and the film was placed in a muffle furnace for heat treatment at 400°C for 4h to obtain an ITO glass substrate with a ZnO seed layer.
[0031] 3. Process parameters for preparing ZnO / PS nanorod arrays: a growth solution of 0.05mol / L was prepared with zinc nitrate and hexamethylenetetramine at 1:1. The prepared ITO glass substrate with the ZnO seed layer...
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[0034] Example 2
[0035]1. Process parameters for preparing ZnO seed layer sol: 0.1mol / L ZnO seed layer sol was prepared by sol-gel method, using zinc acetate as precursor, monoethanolamine as complexing agent, and ethylene glycol methyl ether as solvent.
[0036] 2. The process parameters for preparing the ZnO seed layer: Immerse the ITO glass substrate in the prepared ZnO sol for 20s to make the sol fully contact the surface of the ITO glass substrate, and then vertically pull the ITO glass at a speed of 6cm / min The substrate and wet film were moved into a 100°C incubator for drying treatment for 15 minutes, repeated once, and the film was placed in a muffle furnace for heat treatment at 400°C for 3 hours to obtain an ITO glass substrate with a ZnO seed layer.
[0037] 3. Process parameters for preparing ZnO / PS nanorod arrays: a growth solution of 0.02 mol / L was prepared with zinc nitrate and hexamethylenetetramine at a ratio of 1:1. The prepared ITO glass substrate with t...
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[0040] Example 3
[0041] 1. Process parameters for preparing ZnO seed layer sol: 0.2mol / L ZnO seed layer sol was prepared by sol-gel method, using zinc acetate as precursor, monoethanolamine as complexing agent, and ethylene glycol methyl ether as solvent.
[0042] 2. The process parameters for preparing the ZnO seed layer: Immerse the ITO glass substrate in the prepared ZnO sol for 20s to make the sol fully contact the surface of the ITO glass substrate, and then vertically pull the ITO glass at a speed of 6cm / min The substrate and the wet film were moved into a 100°C incubator for drying treatment for 18 minutes, the operation was repeated once, and the film was placed in a muffle furnace for heat treatment at 400°C for 3.5 hours to obtain an ITO glass substrate with a ZnO seed layer.
[0043] 3. Process parameters for preparing ZnO / PS nanorod arrays: a growth solution of 0.03 mol / L was prepared with zinc nitrate and hexamethylenetetramine at a ratio of 1:1. The prepared I...
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