A method for preparing a large-area micro-nano convex spherical lens array

Abstract

A method for large-area preparation of a micro-nano convex ball lens array by combining electron-beam lithography (EBL) and reactive ion etching (RIE) comprises the following steps of 1 cleaning the surface of a diamond and evaporating adhesion layer metal, 2 spin-coating an HSQ layer on the surface of a diamond sample evaporated with the adhesion layer metal and performing prebaking, 3 exposing the HSQ layer on the surface of the diamond sample in an EBL system, 4 performing development and fixation on the exposed HSQ layer, 5 adopting the RIE to remove the adhesion layer metal around a periodic cylindrical silicon oxide mask, 6 adopting the RIE to form a periodic convex ball lens array structure. The method is simple and flexible, preparation of the large-area convex ball structure on the surface of the diamond can be achieved, and the method is potentially applied to diamond NV color center single-photon devices and the like.

Description

technical field [0001] The invention relates to the fields of micro-nano processing technology and optical quantum communication technology, specifically, a method for preparing a large-area optical quantum radiation micro-nano lens array. Background technique [0002] Miniaturization, arraying, and integration are the development directions of optical information technology. As one of the commonly used optical devices in this direction, microlenses and their arrays are widely concerned by researchers. Researchers have developed holographic methods, photoresist melting methods, photosensitive glass methods, and laser etching methods to prepare microlenses and their arrays. These processes can realize the mass production of structural devices, and at the same time meet the current application requirements to a certain extent. However, their disadvantage is that many processes prepare structures on polymers such as photoresist and PDMS, which are not suitable for occasions th...

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Problems solved by technology

[0004] Most of the quadratic micro-curved surfaces reported in the literature are processed one by one by focused gallium ion beam etching, which not only has low processing efficiency, but also has pollution problems such as polycrystalline carbon sputtering redeposition and gallium ion lattice implantation.

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