A flexible thermoelectric thin film device
A thermoelectric thin film and device technology, which is applied in thermoelectric device parts, thermoelectric device manufacturing/processing, thermoelectric device node lead wire materials, etc. low problems, to achieve the effect of enhanced bonding force, high reliability, and reliable deposition
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Embodiment 1
[0045] According to the preparation method in the present invention, it is sputtered at normal temperature, and the thermoelectric arm is 6mm long such as figure 1 The flexible thermoelectric thin film device shown. Its preparation process is as follows: ① use a magnetron sputtering apparatus and an electrode mask to press figure 1 Step (1) in the preparation of Cu electrode film and Ni transition layer. The parts that do not need to be sputtered are covered with an electrode mask. Under the pressure of 1.5Pa, the sputtering power of 30W, and the substrate temperature of 100°C, the copper electrode film is sputtered on the polyimide flexible substrate with a magnetron sputtering device for 2 hours. , and then sputter nickel transition layer 0.25h. ②Use a magnetron sputtering apparatus and a BST thermoelectric material mask to press figure 1 Step (2) in prepares BST (Bi 2-x Sb x Te 3 , x=1.2~2.0) thermoelectric thin film. The parts that do not need to be sputtered are co...
Embodiment 2
[0048] According to the preparation method in the present invention, a flexible thermoelectric thin film device with a sputtering temperature of 350° C. and a thermoelectric arm of 6 mm in length is prepared. The preparation process is as follows: ①Use a magnetron sputtering apparatus and an electrode mask figure 1 Step (1) in the preparation of Cu electrode film and Ni transition layer. Use an electrode mask to cover the part that does not need to be sputtered, and adjust the magnetron sputtering instrument to sputter copper on the polyimide flexible substrate under the conditions of air pressure 1.5Pa, sputtering power 30W, and substrate temperature 100°C Electrode thin film 2h, then sputter nickel transition layer 0.25h. ② Using magnetron sputtering and BST (Bi 2-x Sb x Te 3 , x=1.2~2.0) The thermoelectric material mask is pressed figure 1 Step (2) in the preparation of BST thermoelectric thin film. Use an electrode mask to cover the part that does not need to be sputt...
Embodiment 3
[0051]According to the preparation method in the present invention, a flexible thermoelectric thin-film device with a thermoelectric arm length of 8 mm, a sputtering temperature of 350° C., and annealing at 350° C. for 1 h is prepared. The preparation process is as follows: ①Use a magnetron sputtering apparatus and an electrode mask according to figure 1 Step (1) in the preparation of Cu electrode film and Ni transition layer. Use an electrode mask to cover the part that does not need to be sputtered, and adjust the magnetron sputtering instrument to sputter the copper electrode film for 2 hours under the conditions of air pressure 1.5Pa, sputtering power 30W, and substrate temperature 100°C, and then sputter Ni transition layer 0.25h. ② Using magnetron sputtering and BST (Bi 2-x Sb x Te 3 , x=1.2~2.0) The mask plate of thermoelectric material is pressed figure 1 In step (2) to prepare BST thermoelectric thin film, cover the parts that do not need to be sputtered with an ...
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