Battery silicon wafer anticorrosive cleaning agent

Abstract

The invention discloses a battery silicon wafer anticorrosive cleaning agent composed of the raw materials of, by weight, 0.5-2.5% of potassium hydroxide, 4-8% of fatty alcohol polyoxyethylene (7) ether, 0.4-0.8% of ethylene glycol butyl ether, 0.4-0.8% of perfluoroalkyl polysorbate alcohol, 0.2-1% of a complex, 2-4% of tetramethyl ammonium hydroxide, 0.1-0.3% of sodium carboxymethylcellulose, and balance of deionized water. The battery silicon wafer anticorrosive cleaning agent provided by the invention has good decontamination and cleaning performances, and has no irritating odor. With the cleaning agent, silicon carbide and the like can be effectively prevented from being adsorbed on the surface of silicon wafers again, and secondary pollution is reduced. The cleaning agent causes low corrosion to the silicon wafer, and is suitable for photovoltaic and semiconductor silicon wafer cleaning. The cleaning agent is especially suitable for solar wafer cleaning.

Description

Technical field: [0001] The invention relates to a cleaning agent, in particular to a battery silicon wafer anticorrosion cleaning agent. Background technique: [0002] The appearance of silicon wafers for batteries should be silver-gray before use, and interlayers, blackening, oxidation, fingerprints, and stains or impurities are not allowed. For high photoelectric conversion efficiency, there must be a silicon wafer with a clean surface, and the metal pollution on the surface must be reduced below the harmful value. At present, multi-wire cutting machines are used in the processing of battery silicon wafers. The multi-wire cutting machines use steel wires to drive silicon carbide abrasives to cut battery silicon wafers, which will cause organic contamination, particle contamination and metal ion contamination on the surface of battery silicon wafers. The pollution of impurities, especially metal ion pollutants such as Cu, Fe, Na, etc., can easily diffuse from the surface ...

AI Technical Summary

Problems solved by technology

[0004] The battery silicon wafer cleaning technology mainly includes the following categories. The RCA cleaning method was commonly used in the early stage. However, due to the high cost of the reagents used in RCA cleaning, the surface of the battery silicon wafer after cleaning is rough, and it is harmful to the environment and human body, so it is not suitable for batteries. Wafer Cleaning