A method for preparing high-density ito target by reducing sintering conditions

A technology with sintering conditions and high density, which is applied in the field of preparing high-density ITO targets by reducing sintering conditions, can solve the problems of high cost, strict control accuracy requirements, and difficulty in ensuring product stability and product stability, so as to improve the sintering power and increase the Large design size, the effect of ensuring the yield

Active Publication Date: 2017-03-08
725TH RES INST OF CHINA SHIPBUILDING INDAL CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In the above-mentioned patents, if the sintering of active raw materials is used or the method of strictly controlling the sintering process, the former limits the selection range of raw materials, and the latter has strict requirements on the control accuracy of the sintering process parameters, it is difficult to ensure product stability or demand. Expensive high-performance equipment to improve product stability at high cost
If the method of adding sintering aids is used, other impurities will be introduced into the ITO target material, which will affect the quality of the ITO target material, and will not meet the purity requirements of high-end ITO target materials.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Take 5000g of ITO powder with a purity greater than 99.99% and an average particle size of 40nm. The solid phase content of the ITO powder in the first premixed liquid is required to be controlled at 40%. According to this requirement, 7500g of water is weighed, and ammonia water is added to the water to mix and stir Uniformly prepare the first premix, the amount of ammonia added is equal to 9 with the pH value of the first premix, all the above ITO powders are poured into the first premix and stirred evenly to prepare the initial ITO slurry, The initial ITO slurry is placed in a ball mill for ball milling, and the milling time is such that the viscosity of the initial ITO slurry reaches 0.9 mPa·s. The initial ITO slurry after ball milling is poured into a tray for drying. The temperature of the clean oven used for drying is controlled at 100°C, and the drying time is controlled within 1 day. The initial ITO slurry with a water content of less than 0.5% is called seconda...

Embodiment 2

[0033] Take 5000g of ITO powder with a purity greater than 99.99% and an average particle size of 65nm. The solid phase content of the ITO powder in the first premixed liquid is required to be controlled at 50%. According to this requirement, 5000g of water is weighed, and ammonia water is added to the water to mix and stir Uniformly prepare the first premix, the amount of ammonia added is equal to 10 with the pH value of the first premix, all the above-mentioned ITO powders are poured into the first premix and stirred evenly to prepare the initial ITO slurry, The initial ITO slurry is placed in a ball mill for ball milling. The ball milling time is about 10 hours, and its viscosity value reaches 5.5mPa·s. The initial ITO slurry after ball milling is poured into a tray for drying. The temperature of the clean oven used for drying is controlled at 120°C, and the drying time is controlled within 1 day. The initial ITO slurry with a water content of less than 0.5% is called second...

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Abstract

Provided is a method for preparing a high-density ITO target on conditions of reducing sintering temperature. According to the method, in preparation of ITO slurry during the initial period, first premixing liquid needs to be prepared first and a ball mill is used; an oven is used in low-temperature drying preparation of a secondary material; in preparation of the ITO slurry, second premixing liquid needs to be prepared first and the ball mill is used again, a grouting forming method is adopted in the forming processing of ITO blank and compressed air serves as a pressure transmitting medium, and normal pressure oxygen atmosphere conditions are adopted in the sintering processing of the ITO blank. The ITO slurry with a high solid phase content is one requirement for preparing the high-density ITO blank, the relative density of the prepared ITO blank can be as high as 74-76% through measurement in a mercury emission method, the solid content of the ITO slurry is 89-91% through ball milling of the secondary material, and the high-density ITO target with the relative density as high as 99.50-99.67% can be prepared through good viscosity mobility and the low sintering temperature.

Description

technical field [0001] The invention belongs to the technical field of preparing ITO targets, and in particular relates to a method for preparing high-density ITO targets by reducing sintering conditions. Background technique [0002] ITO is the abbreviation of Tin-doped Indium Oxide. The meaning of ITO refers to an indium tin oxide material. The ITO target is a sintered body made of indium tin oxide. [0003] High-density ITO targets are mainly prepared by sintering under normal pressure conditions. During sintering, raw material powders with sintering activity are selected or sintering aids are added. [0004] Patent CN201010597008 discloses a method for preparing ITO targets by pressureless sintering in an oxygen atmosphere. By optimizing the sintering process, an ITO target with a relative density of 99.4% is sintered when the oxygen flow rate is 20L / min, but the sintering temperature is 1600°C. High, the holding time of 60h is too long. [0005] Patent CN200910227780 ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C04B35/64C04B35/457
Inventor 杨硕薛建强师琳璞
Owner 725TH RES INST OF CHINA SHIPBUILDING INDAL CORP
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