External cavity tuning laser

A laser and tone-tuning technology, which is applied in the field of cost-effective external cavity tuning lasers, can solve the problems of being unable to adapt to the application of lidar point cloud data, low overall system speed, and slow frame switching speed, achieving cost advantages, low production costs, The effect of improving tuning accuracy and resolution

Active Publication Date: 2015-12-02
SHENZHEN LITRA TECH
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Based on the MEMS micromirror array, in addition to the high cost, the frame switching speed is slow, resulting in a low overall system speed, which cannot adapt to applications such as lidar that require fast scanning to obtain point cloud data.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • External cavity tuning laser
  • External cavity tuning laser
  • External cavity tuning laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment example 1

[0027] This embodiment provides an external cavity tuned laser, which can obtain a linear frequency-sweeping output through the pattern design of the metal-plated thin line area pattern on the mirror. This embodiment is suitable for optical frequency-modulated continuous wave laser radar as a frequency-sweeping laser light source.

[0028] This example figure 1 As shown, the laser gain chip 1 has a center wavelength of 810 nm in the gain region, and its gain wavelength can be adjusted in the range of 780 nm to 840 nm. The laser gain chip 1 can be formed by a semiconductor Fabry Perot laser. The back end of the laser gain chip 1 has a high-reflection HR coating 11 for the 800nm ​​infrared band, and the front end has an anti-reflection AR coating 12, so that as much laser light as possible can be emitted from the front end of the laser gain chip 1 and enters the collimating lens 2, wherein the laser output power used is 5mW. After the laser passes through the laser gain chip 1,...

Embodiment example 2

[0031] This embodiment provides a dual-wavelength external cavity tuned laser. Dual-wavelength lasers are often used in the fields of continuous wave difference frequency generation of terahertz waves, non-contact optical sensing, etc. There are many methods for manufacturing dual-wavelength lasers. achieve, such as Figure 4 As shown, the metal-plated fine-line area pattern set on the reflector is a pattern composed of two parallel gold-plated curves, which includes the metal-plated thin-line area pattern composed of metal-plated curve 401 and metal-plated curve 402. In this implementation The optical setting of the case is the same as that of the implementation case 1, and the laser gain chip adopts the same product. The pattern of mirror 5 is as Figure 4 As shown in , the two parallel curves represent the selected two wavelengths, and the wavelength spacing remains unchanged during the sweeping process, and the following is obtained: Figure 5 The wavelength-time curve ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an external cavity tuning laser, comprising a laser gaining chip for performing wavelength gaining on laser, a collimating lens for collimating a laser beam, a grating for generating first level diffraction light and zero level diffraction light by the collimated laser beam, a focusing lens for condensation transmission on the first level diffraction light, a reflection lens for performing selective reflection on the first level diffraction light subject to condensation transmission and a motor for driving the reflection lens to rotate, wherein the reflection lens is also provided with a metallizing fine line region pattern. According to the metallizing fine line region pattern, a micromachining process comprises photoetching and thin film depositing to realize manufacturing of the patterns, different pattern designs can realize an adjusting function of different wavelengths, such as a mono-wavelength linear tuning laser, a dual wavelength tuning laser, and a multi-wavelength tuning laser, and further meets application requirements of the tuning lasers in different occasions.

Description

technical field [0001] The invention relates to the field of external cavity tuning lasers, in particular to a cost-effective external cavity tuning laser that can be used in laser radar systems. Background technique [0002] External-cavity-tuned lasers are key devices in the fields of optical communications, spectroscopy, lidar, and optical coherence tomography. External cavity tuned lasers based on semiconductor gain chips have been widely studied and applied due to their relatively high integration and relatively simple optical system design. The traditional structures mainly include Littman and Littrow designs. The Littrow design achieves wavelength-selective feedback back to the laser gain chip by adjusting the angle between the grating and the incident laser. The disadvantage of this design is that the direction of the outgoing light is not fixed, which causes great inconvenience to the subsequent construction of the optical path. In the Littman structure, by adjusti...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/14H01S5/06
Inventor 张忠祥
Owner SHENZHEN LITRA TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products