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A method for removing Zn impurity elements in vacuum coating equipment

A technology of impurity elements and vacuum coating, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of not reaching the cleaning effect of Zn element, the limited cleaning effect of Zn element, etc., and achieve glow reaction The effect of short time, saving material cost, and simplifying the operation control link

Active Publication Date: 2017-07-11
HANERGY MOBILE ENERGY HLDG GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cleaning effect on Zn elements is very limited, and the cleaning effect on Zn elements cannot be achieved. At present, there is no effective cleaning method specifically for Zn elements.

Method used

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  • A method for removing Zn impurity elements in vacuum coating equipment

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Effect test

Embodiment 1

[0022] The invention discloses a method for removing Zn impurity elements in vacuum coating equipment. After depositing an amorphous silicon thin film battery, oxygen source gas, hydrogen source gas and carbon source gas are introduced into the reaction chamber to remove Zn impurities. NF is passed before the first and second steps of the element operation step 3 and Ar gas to remove residual Si elements, and completely remove residual gas, and then follow the steps below:

[0023] The first step, feed hydrogen source gas and oxygen source gas into the reaction chamber, the flow rate of the oxygen source gas is 3 sccm to keep the temperature of the reaction chamber at 100°C, and adjust the radio frequency discharge power density at 60mw / cm 2 Perform glow discharge to activate the system, control the air pressure at 3mbar, make the hydrogen source gas, oxygen source gas and Zn element react to form Zn compounds, control the reaction to last for 200 seconds, stop the glow discha...

Embodiment 2

[0027] The invention discloses a method for removing Zn impurity elements in vacuum coating equipment. After depositing an amorphous silicon thin film battery, oxygen source gas, hydrogen source gas and carbon source gas are introduced into the reaction chamber to remove Zn impurities. NF is passed before the first and second steps of the element operation step 3 and Ar gas to remove residual Si elements, and completely remove residual gas, and then follow the steps below:

[0028] The first step, feed hydrogen source gas and oxygen source gas into the reaction chamber, the flow rate of the oxygen source gas is 3sccm to keep the temperature of the reaction chamber at 110°C, and adjust the radio frequency discharge power density at 40mw / cm 2 Perform glow discharge to activate the system, control the air pressure at 1.5mbar, make the hydrogen source gas, oxygen source gas and Zn element react to form Zn compound, control the reaction to last for 100 seconds, stop the glow discha...

Embodiment 3

[0032] The invention discloses a method for removing Zn impurity elements in vacuum coating equipment. After depositing an amorphous silicon thin film battery, oxygen source gas, hydrogen source gas and carbon source gas are introduced into the reaction chamber to remove Zn impurities. NF is passed before the first and second steps of the element operation step 3 and Ar gas to remove residual Si elements, and completely remove residual gas, and then follow the steps below:

[0033] The first step, feed hydrogen source gas and oxygen source gas into the reaction chamber, the flow rate of the oxygen source gas is 4 sccm to keep the temperature of the reaction chamber at 115°C, and adjust the radio frequency discharge power density at 30mw / cm 2 Perform glow discharge to activate the system, control the air pressure at 1.5mbar, make the hydrogen source gas, oxygen source gas and Zn element react to form Zn compounds, control the reaction to last for 50 seconds, stop the glow disch...

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PUM

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Abstract

The invention discloses a method for removing Zn impurity elements in vacuum coating equipment. After depositing non-microcrystalline silicon thin film batteries, oxygen source gas, hydrogen source gas and carbon source gas are introduced into the reaction chamber. The first step is to react The hydrogen source gas and the oxygen source gas are fed into the cavity, so that the hydrogen source gas, the oxygen source gas and the Zn element react to form a Zn compound, and the reaction is controlled to last between 50 and 200 seconds, the glow discharge is stopped, and the residual gas is pumped out of the vacuum cavity; The second step is to feed the carbon source gas into the reaction chamber to make the carbon source gas react with the Zn element to form a Zn compound. Control the air pressure at 0.5-2mbar, and the reaction lasts for 50-200 seconds. Stop the glow discharge and pump out the residual gas Vacuum chamber; the first step and the second step are carried out alternately. The method for removing Zn impurity elements in vacuum coating equipment of the present invention has the characteristics of good Zn impurity element removal effect, convenient operation, low cost and high production efficiency.

Description

technical field [0001] The invention relates to the technical field of thin film solar cells, in particular to a method for removing Zn impurity elements in vacuum coating equipment. Background technique [0002] The quality of the solar cell film has a key influence on the performance of the solar cell. High film quality is an essential element to ensure the performance of the battery. In order to ensure high film quality, in addition to controlling the purity of various reaction gases, it is also necessary to prevent any other sources of pollution. [0003] The PECVD system widely used in today's industry uses a pair of electrodes parallel to each other in the shape of a flat plate to excite plasma and provide a surface for film deposition or etching. The two electrode plates are the grounded positive electrode and the excitation electrode (negative electrode) used to excite the plasma. The conventional excitation methods are radio frequency (RF) and very high frequency ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/452
Inventor 马姣民惠述伟
Owner HANERGY MOBILE ENERGY HLDG GRP CO LTD