A kind of preparation method of ordered vertical pore double-pass membrane and product thereof
A vertical channel, double-pass membrane technology, applied in the field of nanoporous membranes, can solve problems such as affecting the separation function of mesoporous molecules, and achieve the effects of ultra-thin thickness, uniform pore size distribution, and high porosity
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Embodiment 1
[0043] (1) Using the ITO electrode as the substrate I, the mesoporous SiO with vertical channels was prepared on it 2 Membrane: Substrate I was put into a mixed solution I consisting of 0.16 g CTAB, 80 μL TEOS, 70 mL water, 30 mL ethanol and 10 μL ammonia water with a concentration of 25% by mass and allowed to grow for 12 hours.
[0044] (2) Prepare 5% PMMA solution with phenylethanol as solvent, spin-coat PMMA solution on this mesoporous SiO with the speed of 3000rpm 2 on the membrane; dry at room temperature for 1h, and dry at 115°C for 15min; obtain PMMA / mesoporous SiO supported on substrate I 2 membrane.
[0045] (3) Using 2M hydrochloric acid as the etching solution, the PMMA / mesoporous SiO loaded on the substrate I 2 The film was etched in etching solution for 12h. At this point PMMA / mesoporous SiO 2 The membrane will separate from the substrate I.
[0046] (4) PMMA / mesoporous SiO 2 The membrane was taken out from the etching solution, rinsed in water for 10 min, ...
Embodiment 2
[0054] (1) Using the ITO electrode as the substrate I, the mesoporous SiO with vertical channels was prepared on it 2 Membrane: Prepare a solution consisting of 1.585gCTAB, 3.0314g TEOS, 20mL water, 20mL ethanol, 0.17g sodium nitrate and 1.67μL 12M hydrochloric acid, stir at room temperature for 2.5h to obtain a uniform mixed solution II; put the substrate I into the mixed solution II Among them, it is used as the working electrode, Ag / AgCl / KCl is used as the reference electrode, and the platinum sheet is used as the counter electrode. Apply a density of -0.3mAcm on substrate I -2 Constant current 16s, wash.
[0055] (2) Prepare 5% PMMA solution with phenylethanol as solvent, spin-coat PMMA solution on this mesoporous SiO with the speed of 3000rpm 2 on the membrane; dry at room temperature for 1h, and dry at 115°C for 15min; obtain PMMA / mesoporous SiO supported on substrate I 2 membrane.
[0056] (3) Using 2M hydrochloric acid as the etching solution, the PMMA / mesoporous S...
Embodiment 3
[0060] (1) Using the ITO electrode as the substrate I, the mesoporous SiO with vertical channels was prepared on it 2 Membrane: Substrate I was put into a mixed solution I consisting of 0.16 g CTAB, 80 μL TEOS, 70 mL water, 30 mL ethanol and 10 μL ammonia water with a concentration of 25% by mass and allowed to grow for 12 hours.
[0061] (2) Prepare 5% PMMA solution with phenylethanol as solvent, spin-coat PMMA solution on this mesoporous SiO with the speed of 3000rpm 2 on the membrane; dry at room temperature for 1h, and dry at 115°C for 15min; obtain PMMA / mesoporous SiO supported on substrate I 2 membrane.
[0062] (3) Using 2M hydrochloric acid as the etching solution, the PMMA / mesoporous SiO loaded on the substrate I 2 The film was etched in etching solution for 12h. At this point PMMA / mesoporous SiO 2 The membrane will separate from the substrate I.
[0063] (4) PMMA / mesoporous SiO 2 The membrane was taken out from the etching solution, rinsed in water for 10 min, ...
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