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Aluminum chemical polishing solution and polishing method with same

A technology of chemical polishing and polishing liquid, applied in the field of chemical polishing liquid, which can solve the problems of high corrosion rate, too long polishing time, and pitting on the metal surface.

Active Publication Date: 2016-02-17
浙江瑞特良微电子材料有限公司
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0006] However, there are still some problems in the alkaline chemical polishing solution at present. The corrosion rate of aluminum, aluminum alloys and their oxides in the alkaline chemical polishing solution is relatively high, so the polishing time cannot be too long, otherwise pitting will occur on the metal surface. Greater weight loss

Method used

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  • Aluminum chemical polishing solution and polishing method with same
  • Aluminum chemical polishing solution and polishing method with same

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Experimental program
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Effect test

preparation example Construction

[0067] Preparation of Cationic Polymers

[0068] Cationic polymers can be prepared by continuous or batch methods using any method known to those skilled in the art, including solution polymerization, emulsion polymerization and suspension polymerization.

[0069] The polymerization of the cationic polymer monomer used in the present invention is initiated by initiator, and the initiator selected can be inorganic peroxygen initiator, such as ammonium persulfate, sodium persulfate, potassium persulfate; azo initiator, Examples include azobisisobutyronitrile and azobisisoheptanonitrile.

[0070] First the initiator decomposes, forming primary free radicals. The obtained primary free radicals further react with monomers to form monomeric free radicals. The decomposition of the initiator is an endothermic reaction with high activation energy. The step of primary free radicals combining with monomers to form monomer free radicals is an exothermic reaction with high activity of ...

Embodiment

[0113] Embodiment (by weight)

[0114]

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PUM

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Abstract

The invention relates to an aluminum chemical polishing solution and a polishing method with the same, in particular to a chemical polishing solution used for polishing aluminum, aluminum alloys, aluminum oxide and aluminum alloy oxide. Each liter of polishing solution at least comprises 100-450 g of an alkali compound, 60-120 g of NaNO2, 0.5-20 g of a chelating agent, 0.5-20 g of cationic polymer and the balance water. The alkali compound is selected from at least one of NaOH, KOH and Ba(OH)2, tridentate ligand serves as the chelating agent, and ligating atoms are selected from N and / or O.

Description

technical field [0001] The invention relates to a chemical polishing liquid and a polishing method using the polishing liquid. More particularly, the present invention relates to chemical polishing fluids for polishing aluminum, aluminum alloys, aluminum oxides and aluminum alloy oxides. Background technique [0002] The content of aluminum in the earth's crust is second only to oxygen and silicon, and is the most abundant metal element in the earth's crust. Aluminum products have the characteristics of light weight, good ductility, and strong corrosion resistance. They are widely used in aviation industry, construction industry, automobile industry, instrumentation engineering, and daily hardware. [0003] In the use of aluminum and aluminum alloys, surface polishing is an important processing technology. At present, the surface polishing of aluminum and aluminum alloys can be divided into mechanical polishing, electrolytic polishing and chemical polishing. The labor int...

Claims

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Application Information

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IPC IPC(8): C23F3/02
Inventor 吴育祥李德荣何友余
Owner 浙江瑞特良微电子材料有限公司
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