Water removal method for silicon tetrafluoride

A silicon tetrafluoride, water tower technology, applied in the direction of halogenated silicon compounds, halogenated silanes, etc., can solve problems such as difficult removal, and achieve the effect of simple operation and high purity

Inactive Publication Date: 2016-02-24
718TH RES INST OF CHINA SHIPBUILDING INDAL CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] At the same time, silicon tetrafluoride will also be generated during the adsorption proce

Method used

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  • Water removal method for silicon tetrafluoride

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Experimental program
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Effect test

Embodiment 1

[0048] A method for removing water from silicon tetrafluoride, the specific steps of the method are as follows:

[0049] (1) The operating pressure of the water removal tower is set to be 0.05MPa, and the temperature is -20°C, and silicon tetrafluoride, N 2 Pass carbonyl fluoride into a water removal tower equipped with 4×4 stainless steel θ ring packing, carbonyl fluoride contacts with water in silicon tetrafluoride, a reaction as shown in formula I occurs, and removes water in silicon tetrafluoride , to obtain product 1; product 1 was condensed by a condenser to obtain product 2; after testing, the water content in product 2 was 80ppb.

[0050] COF 2 +H 2 O=CO 2 +2HF I;

[0051] Among them, the condenser uses liquid nitrogen as the condensing medium, and the outlet gas temperature of the condenser is controlled to -30°C by adjusting the flow of liquid nitrogen, and the unreacted carbonyl fluoride is refluxed to the water removal tower through the top condenser for reuse....

Embodiment 2

[0059] A method for removing water from silicon tetrafluoride, the specific steps of the method are as follows:

[0060] (1) The operating pressure of the water removal tower is set to be 1MPa, and the temperature is 30°C, and silicon tetrafluoride, N 2 Pass carbonyl fluoride into a water removal tower equipped with 4×4 stainless steel θ ring packing, carbonyl fluoride contacts with water in silicon tetrafluoride, a reaction as shown in formula I occurs, and removes water in silicon tetrafluoride , to obtain product 1; product 1 was condensed by a condenser to obtain product 2; after testing, the water content in product 2 was 20ppb.

[0061] COF 2 +H 2 O=CO 2 +2HF I;

[0062] Among them, the condenser uses liquid nitrogen as the condensing medium, and the outlet gas temperature of the condenser is controlled to -30°C by adjusting the flow of liquid nitrogen, and the unreacted carbonyl fluoride is refluxed to the water removal tower through the top condenser for reuse.

...

Embodiment 3

[0070] A method for removing water from silicon tetrafluoride, the specific steps of the method are as follows:

[0071] (1) The operating pressure of the water removal tower is set to be 0.5MPa, and the temperature is 20°C, and silicon tetrafluoride, O 2 Pass carbonyl fluoride into a water removal tower equipped with 4×4 stainless steel θ ring packing, carbonyl fluoride contacts with water in silicon tetrafluoride, a reaction as shown in formula I occurs, and removes water in silicon tetrafluoride , to obtain product 1; product 1 was condensed by a condenser to obtain product 2; after testing, the water content in product 2 was 50ppb.

[0072] COF 2 +H 2 O=CO 2 +2HF I;

[0073] Among them, the condenser uses liquid nitrogen as the condensing medium, and the outlet gas temperature of the condenser is controlled to -40°C by adjusting the flow rate of liquid nitrogen, and the unreacted carbonyl fluoride is refluxed to the water removal tower through the top condenser for reu...

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Abstract

The invention discloses a water removal method for silicon tetrafluoride, and belongs to the field of fluorine chemical and electronic industry gas. The method comprises the following steps: introducing silicon tetrafluoride, diluent gas and carbonyl fluoride in a water removal tower filled with a filler, carrying out a reaction through the contact of the carbonyl fluoride and water in the silicon tetrafluoride, removing the water in the silicon tetrafluoride to obtain a product 1; carrying out condensation treatment on the product 1 to obtain a product 2; carrying out adsorption and low-temperature fractionation treatment on the product 2 in sequence; and collecting the silicon tetrafluoride to complete water removal of the silicon tetrafluoride. The water removal method is simple in operation; the water in the silicon tetrafluoride can be effectively removed; and through detection, the purity of the silicon tetrafluoride product is as high as 99.999%, water is not detected, and the content of hexafluoride disiloxane ((SiF3)2O) is as low as at most 20 ppb.

Description

technical field [0001] The invention relates to a method for removing water from silicon tetrafluoride, which belongs to the fields of fluorine chemical industry and electronic industry gas. Background technique [0002] SiF 4 In the electronics and semiconductor industries, it is mainly used as etchant for silicon nitride, tantalum silicide, etc., P-type dopant, epitaxial deposition diffusion silicon source, etc., and can also be used for the preparation of electronic grade silane or silicon. SiF 4 It can also be used as a raw material for high-purity quartz glass for optical fibers. It can be hydrolyzed in a high-temperature flame to produce a heat sink SiO with a high specific surface area. 2 . With the development of electron gas towards ultra-pure direction, the impurity index is changed from 10 -6 to 10 -9 Even higher purity developments, SiF 4 Siloxane impurities in the gas must be effectively removed. [0003] The silicon tetrafluoride gas produced by the wet ...

Claims

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Application Information

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IPC IPC(8): C01B33/107
Inventor 岳立平蒋玉贵柳彤张净普乔蓓蓓李丹丹冀延治
Owner 718TH RES INST OF CHINA SHIPBUILDING INDAL CORP
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