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Polishing solution for ceramic bonded sapphire polishing, and preparation method thereof

A technology of sapphire and polishing fluid, which is applied in the field of sapphire polishing, can solve the problems of low polishing efficiency and high surface roughness of wafers, and achieve the effects of saving production costs, improving polishing efficiency and polishing quality

Inactive Publication Date: 2016-03-09
LENS TECH CHANGSHA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a polishing liquid for ceramic bonding sapphire polishing, to solve the technical problems of low polishing efficiency and high surface roughness of the wafer generally existing in the process of processing ceramic bonding sapphire workpieces

Method used

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  • Polishing solution for ceramic bonded sapphire polishing, and preparation method thereof
  • Polishing solution for ceramic bonded sapphire polishing, and preparation method thereof
  • Polishing solution for ceramic bonded sapphire polishing, and preparation method thereof

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Embodiment 1

[0029] Formula (weight percentage):

[0030] 94-97 parts of silica sol, 0.4-0.6 parts of dispersant, 0.1-0.25 parts of wetting agent, 0.2-0.4 parts of brightener, 0-0.08 parts of oxidizing agent, 0.04-0.5 parts of pH value regulator, and the balance Deionized water.

[0031] The preparation is completed by the following process steps:

[0032] A. Weigh an appropriate amount of brightener and dissolve it in a small amount of water. After it is fully dissolved, add a dispersant and a wetting agent to make a mixed solution, stir and mix evenly and then stand still to obtain reagent 1;

[0033] B. Weigh an appropriate amount of oxidant, slowly add a small amount of water, stir to make it fully dissolved, and then stand still to obtain reagent 2;

[0034] C. Use a 500-mesh screen filter system to remove impurity particles in the silica sol raw material, and add it to the cleaned reactor along with the pumping equipment;

[0035] D. Stir the filtered 35-50wt% silica sol at a rotation speed of...

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PUM

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Abstract

The invention provides a polishing solution for ceramic bonded sapphire polishing, and a preparation method thereof. The polishing solution comprises, by mass, 94-97 parts of silica sol, 0.4-0.6 parts of a dispersant, 0.1-0.25 parts of a wetting agent, 0.2-0.4 parts of a brightener, 0-0.08 parts of an oxidant, 0.04-0.5 parts of a pH adjusting agent, and the balance of deionized water. The polishing solution for ceramic bonded sapphire polishing has the advantages of good removal rate in the processing process,, excellent lubrication effect, good quality of the surface of a processed product, simple processing and preparation method, low cost, high polishing efficiency and low roughness.

Description

Technical field [0001] The present invention relates to the technical field of sapphire polishing, in particular to a polishing liquid for A-direction sapphire polishing and a preparation method thereof. Background technique [0002] Sapphire (Sapphire), also known as white gem, molecular formula is Al 2 O 3 , Is a multifunctional oxide crystal with a hexagonal crystal structure. It has excellent optical, physical and chemical properties. Compared with natural gemstones, it has the characteristics of high hardness, high melting point, good light transmission, excellent thermal conductivity and electrical insulation, good wear resistance, and stable corrosion resistance. Therefore, it is widely used in optoelectronics, communications, and national defense. And other fields. Sapphire crystal (α-Al 2 O 3 ) Is a simple coordination type oxide crystal of hexagonal crystal system, and many characteristics are determined by its crystal orientation. If a four-axis oriented coordinate s...

Claims

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Application Information

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IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 周群飞饶桥兵吴朝文
Owner LENS TECH CHANGSHA
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