Polishing solution for A orientation sapphire polishing, and preparation method thereof
A polishing liquid and sapphire technology, applied in the field of sapphire polishing, can solve the problems of excessive loss of auxiliary materials, high wafer surface roughness, and low polishing efficiency, and achieve the effects of saving production costs, improving polishing efficiency and polishing quality
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[0025] Formula (percentage by weight):
[0026] 92-97 parts of silica sol, 0.01-1 part of active dispersant, 0.01-1 part of wetting agent, 0.01-2 parts of polishing aid, 0.01-1 part of oxidizing agent, 0.01-2 parts of pH regulator, and the balance for deionized water.
[0027] During preparation, it is completed by the following process steps:
[0028] A. Use a 500-mesh screen filter system to remove impurity particles in the silica sol raw material;
[0029] B. Stir the above-mentioned filtered 35-55 wt% silica sol at a speed of 60-120 rpm, and then add active dispersant, wetting agent and polishing aid at a flow rate of 0.5-2.0 L / min;
[0030] C. Continue to add the oxidizing agent and the pH regulator at a flow rate of 0.5-2.0 L / min, and adjust the pH value to 9.5-11, and obtain the finished polishing solution after purification.
[0031] The following examples adopt the same preparation method as Example 1, and the specific substances and weight percentages used in its ...
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