An organic-inorganic perovskite thin-film solar cell based on an n-type bismuth-based electron collection layer and its preparation method
An electron collection layer, solar cell technology, applied in organic semiconductor devices, circuits, photovoltaic power generation, etc., can solve the problems of low material selectivity, complex production process, high price, etc., and achieve good hydrophobic performance, abundant resources, high performance stable effect
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Embodiment 1
[0045] A method for preparing an organic-inorganic perovskite thin-film solar cell based on an N-type bismuth-based electron collection layer in this embodiment includes the steps of preparing a P-type hole conducting layer and the preparation of a P-type organic-inorganic perovskite absorbing layer. Preparation steps, preparation steps of N-type bismuth-based electron collection layer, deposition steps of metal electrode layer:
[0046] 1. The preparation steps of the P-type hole conducting layer: depositing the P-type hole conducting layer 2 on the transparent conductive substrate 1 by spin coating;
[0047] The transparent conductive substrate is ITO conductive glass, the thickness of the ITO conductive layer is 200nm, and the thickness of the glass substrate is 1mm;
[0048] The P-type hole conduction layer is NiO material with a thickness of 60nm;
[0049] Weigh 0.248g of nickel acetate tetrahydrate and dissolve it in 12.4g of 2-methoxyethanol, then add 0.1ml of monoetha...
Embodiment 2
[0058] A method for preparing an organic-inorganic perovskite thin-film solar cell based on an N-type bismuth-based electron collection layer in this embodiment includes the steps of preparing a P-type hole conducting layer, and the preparation of a P-type organic-inorganic perovskite absorbing layer. Preparation steps, preparation steps of N-type bismuth-based electron collection layer, deposition steps of metal electrode layer:
[0059] 1. The preparation steps of the P-type hole conducting layer: depositing the P-type hole conducting layer 2 on the transparent conductive substrate 1 by spin coating;
[0060] The transparent conductive substrate is ITO conductive glass, the thickness of the ITO conductive layer is 200nm, and the thickness of the glass substrate is 1mm;
[0061] The P-type hole conduction layer is NiO material with a thickness of 20nm;
[0062] Weigh 0.248g of nickel acetate tetrahydrate and dissolve it in 12.4g of 2-methoxyethanol, then add 0.1ml of monoeth...
Embodiment 3
[0073] A method for preparing an organic-inorganic perovskite thin-film solar cell based on an N-type bismuth-based electron collection layer in this embodiment includes the steps of preparing a P-type hole conducting layer and the preparation of a P-type organic-inorganic perovskite absorbing layer. Preparation steps, preparation steps of N-type bismuth-based electron collection layer, metal electrode layer deposition steps:
[0074] 1. The preparation steps of the P-type hole conducting layer: depositing the P-type hole conducting layer 2 on the transparent conductive substrate 1 by spin coating;
[0075] The transparent conductive substrate is ITO conductive glass, the thickness of the ITO conductive layer is 200nm, and the thickness of the glass substrate is 1mm;
[0076] The P-type hole conduction layer is NiO material with a thickness of 60nm;
[0077] Weigh 0.248g of nickel acetate tetrahydrate and dissolve it in 12.4g of 2-methoxyethanol, then add 0.1ml of monoethanol...
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