Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for processing compact disc (CD) stripe on substrate surface by applying etching process

A base material surface and base material technology, which is applied in the field of processing CD patterns on the substrate surface by etching technology, can solve the problems of high cost of CD pattern molds, low processing accuracy, and inability to make CD patterns, etc., reaching the scope of application Wide, strong three-dimensional effect, good glare effect

Inactive Publication Date: 2016-06-15
NANJING J CRYSTAL PHOTOELECTRIC TECH
View PDF2 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the ink used in this patent is printed on the surface of a hard material, the adhesion is not high enough to prevent scratches, the processing accuracy is not high, and it is impossible to make nano-level CD patterns
[0007] For the third processing method, the cost of CD pattern mold is high, the mold life is short, and the molding efficiency is low, which is only suitable for the base material of plastic material

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for processing compact disc (CD) stripe on substrate surface by applying etching process
  • Method for processing compact disc (CD) stripe on substrate surface by applying etching process
  • Method for processing compact disc (CD) stripe on substrate surface by applying etching process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] see Figure 1~Figure 10A method for processing CD lines on the surface of a substrate using an etching process according to the present invention comprises the following steps:

[0043] 1) Make a mask

[0044] According to the different specifications of the CD pattern 1 to be processed, the mask plate 2 is designed and manufactured according to the ratio of the area of ​​the CD pattern 1: the area of ​​the mask plate 2 = 1:1 or 4:1 or 5:1, and is formed in the middle of the surface of the mask plate 2 A CD pattern area 21 corresponding to the CD pattern 1, the CD pattern area 21 includes a light-transmitting area 211 and an opaque area 212;

[0045] Among them, there are currently three types of photolithography machines on the market, which are proximity or contact photolithography machines. The CD pattern area: mask area = 1:1, and this type will be selected when the line width and line space width are above 1um. Lithography machine; CD pattern area: mask area = 4:...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a method for processing a compact disc (CD) stripe on a substrate surface by applying an etching process. The method comprises the following steps of 1) fabricating a mask; 2) coating and baking photoresist thin film; 3) carrying out exposure and baking; 4) carrying out developing and baking; and 5) carrying out etching. The method is high in efficiency, high in accuracy and wide in application range, and is used for processing the CD stripe on the substrate surface by applying a dry etching method or a wet etching method.

Description

technical field [0001] The invention belongs to the technical field of surface treatment, and in particular relates to a method for processing CD lines on the surface of a substrate by using an etching process. Background technique [0002] CD is the abbreviation of Compact Disc in English, which means "Compressed Disc" in Chinese, referred to as "CD". [0003] The existing CD pattern processing methods are divided into three categories: 1) The CD pattern is processed by machining (CNC machine tool for fine carving) on ​​metal materials; 2) On hard materials (such as sapphire, glass), adopt The CD pattern is processed by printing ink baking method; 3) On plastic materials (such as polycarbonate, polyester, polyvinyl chloride, polymethyl methacrylate), it is processed by making a CD pattern mold and molding UV transparent resin. CD pattern. [0004] Among them, for the first processing method, the machining efficiency is low, the processing accuracy is not high, and nano-le...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/00H01L21/02
CPCG03F7/0035H01L21/02019
Inventor 沈厚军赵博李建勳郑松森
Owner NANJING J CRYSTAL PHOTOELECTRIC TECH