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Photosensitive resin

A technology of photosensitive resin and resin, which is applied in the direction of optics, optomechanical equipment, instruments, etc., can solve the problems of poor adhesion and inability to form via holes, etc., and achieve the effects of increasing the speed of water development, improving reproducibility, and shortening the production cycle

Inactive Publication Date: 2016-06-15
WUXI NANLIGONG TECH DEV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photosensitive resin composition currently used as a color photoresist cannot form a via hole with a gentle slope angle after coating, exposure, and development, so that the ITO is not well attached to the inner surface of the via hole.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Embodiment 1: The ratio of raw materials is: 25 parts of epoxy acrylic resin, 20 parts of maleic anhydride, 5 parts of catalyst N,N-dimethylethanolamine, 14 parts of photopolymerization initiator, 6 parts of water-dispersible latex, rubber 4 parts, 6 parts of inorganic additives modified by organic silane surface and 70 parts of solvent.

[0023] Concrete preparation process is as follows:

[0024] (1) At room temperature, weigh all the raw materials according to the weight ratio, and set aside;

[0025] (2) At room temperature, add maleic anhydride, epoxy acrylic resin and catalyst N,N-dimethylethanolamine to 50% of the total amount of solvent to dissolve, mix and then fully stir to make it evenly mixed;

[0026] (3) Add water-dispersible latex to the homogeneously mixed solution obtained in step (2) and stir evenly, and then evaporate the water in a dryer with a heating temperature of 100°C;

[0027] (4) Add photopolymerization initiator, rubber, organic silane surf...

Embodiment 2

[0029] The ratio of raw materials is: 20 parts of epoxy acrylic resin, 25 parts of maleic anhydride, 3 parts of catalyst N,N-dimethylethanolamine, 10 parts of photopolymerization initiator, 8 parts of water-dispersible latex, 2 parts of rubber, 4 parts of organic silane surface modified inorganic additives and 60 parts of solvent.

[0030] Concrete preparation process is as follows:

[0031] (1) At room temperature, weigh all the raw materials according to the weight ratio, and set aside;

[0032] (2) At room temperature, add maleic anhydride, epoxy acrylic resin and catalyst N,N-dimethylethanolamine to 50% of the total amount of solvent to dissolve, mix and then fully stir to make it evenly mixed;

[0033] (3) Add water-dispersible latex to the homogeneously mixed solution obtained in step (2) and stir evenly, and then evaporate the water in a dryer with a heating temperature of 100°C;

[0034] (4) Add photopolymerization initiator, rubber, organic silane surface-modified i...

Embodiment 3

[0035] Embodiment 3: The ratio of raw materials is: 30 parts of epoxy acrylic resin, 30 parts of maleic anhydride, 6 parts of catalyst N,N-dimethylethanolamine, 20 parts of photopolymerization initiator, 8 parts of water-dispersible latex, rubber 5 parts, 10 parts of inorganic additives modified by organosilane surface and 80 parts of solvent.

[0036] Concrete preparation process is as follows:

[0037] (1) At room temperature, weigh all the raw materials according to the weight ratio, and set aside;

[0038] (2) At room temperature, add maleic anhydride, epoxy acrylic resin and catalyst N,N-dimethylethanolamine to 50% of the total amount of solvent to dissolve, mix and then fully stir to make it evenly mixed;

[0039] (3) Add water-dispersible latex to the homogeneously mixed solution obtained in step (2) and stir evenly, and then evaporate the water in a dryer with a heating temperature of 110°C;

[0040] (4) Add photopolymerization initiator, rubber, organic silane surfa...

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PUM

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Abstract

The invention relates to photosensitive resin.The photosensitive resin is prepared from, by mass, 20-30 parts of epoxy-acrylic resin, 20-30 parts of maleic anhydride, 1-6 parts of catalyst N,N-dimethylethanolamine, 10-20 parts of a photopolymerization initiator, 4-8 parts of water dispersion latex, 1-5 parts of rubber, 4-10 parts of inorganic additives with surfaces modified by organosilane and 60-80 parts of a solvent.The water development speed of the resin can be increased through the water dispersion latex, and meanwhile the image reproducibility is improved; due to the photopolymerization initiator, a liquid crystal display screen manufactured by adopting the resin has the high-quality imaging; in addition, the preparation method of the photosensitive resin is simple and controllable in technological process, short in production period, capable of sufficiently utilizing heat generated by a chemical reaction in the resin synthetizing process, capable of saving energy sources and free of three wastes.

Description

technical field [0001] The invention relates to the field of optoelectronic technology, that is, to a liquid crystal display color filter; in particular to a photosensitive resin field. Background technique [0002] A thin film transistor liquid crystal display (TFT-LCD) is configured such that a glass substrate with a TFT array and a glass substrate with a color filter are stacked at a predetermined pitch, and liquid crystals are injected between the two glass substrates to form a panel, and the panel is applied electrical signal to provide a display. [0003] According to the light source of the backlight, the above-mentioned LCD can be classified into reflective type, transmissive type and transflective type. Reflective LCDs reflect an external light source and use it as a backlight, requiring a pre-installed reflector, while transmissive LCDs use an internal light source as their backlight, ie, the backlight unit's own light. [0004] Transflective LCDs are in the form...

Claims

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Application Information

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IPC IPC(8): G03F7/027
CPCG03F7/027
Inventor 刘玉洁
Owner WUXI NANLIGONG TECH DEV
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