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Preparing method of photosensitive resin

A technology of photosensitive resin and normal temperature, which is applied in the field of liquid crystal display color filters, which can solve the problems of poor adhesion and inability to form via holes, etc., and achieve the effects of increasing water development speed, improving reproducibility, and simple and controllable process flow

Inactive Publication Date: 2016-07-20
WUXI NANLIGONG TECH DEV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photosensitive resin composition currently used as a color photoresist cannot form a via hole with a gentle slope angle after coating, exposure, and development, so that the ITO is not well attached to the inner surface of the via hole.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Embodiment 1: The ratio of raw materials is: 25 parts of epoxy acrylic resin, 20 parts of maleic anhydride, 5 parts of catalyst N,N-dimethylethanolamine, 14 parts of photopolymerization initiator, 6 parts of water-dispersible latex, rubber 4 parts, 6 parts of inorganic additives modified by organic silane surface and 70 parts of solvent.

[0023] Concrete preparation process is as follows:

[0024] (1) At room temperature, weigh all the raw materials according to the weight ratio, and set aside;

[0025] (2) At room temperature, add maleic anhydride, epoxy acrylic resin and catalyst N,N-dimethylethanolamine to 50% of the total amount of solvent to dissolve, mix and then fully stir to make it evenly mixed;

[0026] (3) Add water-dispersible latex to the homogeneously mixed solution obtained in step (2) and stir evenly, and then evaporate the water in a dryer with a heating temperature of 100°C;

[0027] (4) Add photopolymerization initiator, rubber, organic silane surf...

Embodiment 2

[0029] The ratio of raw materials is: 20 parts of epoxy acrylic resin, 25 parts of maleic anhydride, 3 parts of catalyst N,N-dimethylethanolamine, 10 parts of photopolymerization initiator, 8 parts of water-dispersible latex, 2 parts of rubber, 4 parts of organic silane surface modified inorganic additives and 60 parts of solvent.

[0030] Concrete preparation process is as follows:

[0031] (1) At room temperature, weigh all the raw materials according to the weight ratio, and set aside;

[0032] (2) At room temperature, add maleic anhydride, epoxy acrylic resin and catalyst N,N-dimethylethanolamine to 50% of the total amount of solvent to dissolve, mix and then fully stir to make it evenly mixed;

[0033] (3) Add water-dispersible latex to the homogeneously mixed solution obtained in step (2) and stir evenly, and then evaporate the water in a dryer with a heating temperature of 100°C;

[0034] (4) Add photopolymerization initiator, rubber, organic silane surface-modified i...

Embodiment 3

[0035] Embodiment 3: The ratio of raw materials is: 30 parts of epoxy acrylic resin, 30 parts of maleic anhydride, 6 parts of catalyst N,N-dimethylethanolamine, 20 parts of photopolymerization initiator, 8 parts of water-dispersible latex, rubber 5 parts, 10 parts of inorganic additives modified by organosilane surface and 80 parts of solvent.

[0036] Concrete preparation process is as follows:

[0037] (1) At room temperature, weigh all the raw materials according to the weight ratio, and set aside;

[0038] (2) At room temperature, add maleic anhydride, epoxy acrylic resin and catalyst N,N-dimethylethanolamine to 50% of the total amount of solvent to dissolve, mix and then fully stir to make it evenly mixed;

[0039] (3) Add water-dispersible latex to the homogeneously mixed solution obtained in step (2) and stir evenly, and then evaporate the water in a dryer with a heating temperature of 110°C;

[0040] (4) Add photopolymerization initiator, rubber, organic silane surfa...

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PUM

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Abstract

The invention relates to a preparing method of photosensitive resin. The preparing method comprises the following specific steps that 1, at normal temperature, all raw materials are weighed according to the weight ratio for use; 2, at the normal temperature, maleic anhydride, epoxy acrylic resin and a catalyst N,N-dimethylethanolamine are added into solvent accounting for 50% of the total weight, mixed and fully stirred to be mixed uniformly; 3, water dispersibility latex is added into the uniformly-mixed solution obtained in the step 2 to be stirred uniformly, and water is evaporated in a drying machine at the heating temperature of 100-110 DEG C; 4, a polymerization initiator, rubber, inorganic additive subjected to surface modification through organosilane and solvent accounting for 50% of the total weight are added into the mixed solution in the step 3, mixed, dissolved and fully stirred to be mixed uniformly, and then the mixture is placed into a mixing mill to be mixed for at least two hours, and then cured for at least 18 hours at the temperature of 25 DEG C to obtain photosensitive resin.

Description

technical field [0001] The invention relates to the field of optoelectronic technology, that is, to a liquid crystal display color filter; in particular to a photosensitive resin field. Background technique [0002] A thin film transistor liquid crystal display (TFT-LCD) is configured such that a glass substrate with a TFT array and a glass substrate with a color filter are stacked at a predetermined pitch, and liquid crystals are injected between the two glass substrates to form a panel, and the panel is applied electrical signal to provide a display. [0003] According to the light source of the backlight, the above-mentioned LCD can be classified into reflective type, transmissive type and transflective type. Reflective LCDs reflect an external light source and use it as a backlight, requiring a pre-installed reflector, while transmissive LCDs use an internal light source as their backlight, ie, the backlight unit's own light. [0004] Transflective LCDs are in the form...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/027
CPCG03F7/004G03F7/027
Inventor 刘玉洁
Owner WUXI NANLIGONG TECH DEV
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