Method for preparing tungsten functional coating on tantalum surface at low temperature
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A functional and coating technology, applied in coating, metal material coating process, solid-state diffusion coating, etc., can solve the problems of unsuitable tungsten coating on tantalum surface, high energy consumption, high preparation temperature, and overcome corrosion resistance. Poor performance, the effect of overcoming brittleness and improving the degree of densification
Active Publication Date: 2016-06-29
XIAMEN UNIV OF TECH
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[0003] Some researchers form a certain thickness of Ta-W diffusion layer by vacuum electron beam welding combined with hot isostatic pressing process, but the preparation temperature is high, the process is cumbersome, and there are problems of high cost and high energy consumption.
The preparation of pure tungsten coating by CVD method is to use hydrogen and tungsten halide or carbonyl gas as raw materials under normal or low pressure conditions, and finally obtain tungsten coating through mutual reduction reaction on the surface of the substrate under specific temperature conditions. The preparation of tungsten coating on parts by CVD process can directly obtain high-density, high-purity tungsten coating, but tantalum itself absorbs hydrogen and will become brittle and easy to break. This method is not suitable for the preparation of tungsten coating on the surface of tantalum.
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Embodiment 1
[0034] Please refer to figure 1 , a method for preparing a tungsten functional coating on a tantalum surface at a low temperature, comprising the following steps:
[0035] S1, polishing the surface of the substrate, the substrate includes tantalum, tantalum alloy or a combination thereof;
[0036] S2, embedding the polished matrix in an embedding agent for reaction, wherein the embedding temperature is 240-280°C, and the holding time is 1-8h. The embedding agent includes uniformly dispersed WCl6 powder, activator and Al2O3 powder, and the WCl6 powder ratio in the embedding infiltration agent is 30-50wt.%;
[0037] S3, after the heat preservation is completed, the embedded matrix is cleaned and vacuum-dried.
[0038] Using the embedding method, the matrix is embedded in the embedding agent for reaction, and the embedding agent includes uniformly dispersed WCl 6 powder, activator and Al 2 o 3 pink. Diffusion reaction occurs between matrix and embedding agent at 240-280...
Embodiment 2
[0047] The specific ratio of embedding penetrating agent is WCl 6 : 40wt.%, NaF or NH 4 Cl: 15wt.%, Al 2 o 3 : 45wt.%. During the embedding reaction, the temperature of the heat preservation is 280° C., and the heat preservation time is 2 hours.
[0048] Such as Figure 2 to Figure 3 , in the prepared substrate, the tungsten functional coating is closely combined with the substrate, without holes or cracks. Such as image 3 As shown, the spectrum on the side close to the substrate surface figure 1 In the treatment, the weight ratio of metal tungsten reached 59.09wt.%, which shows that the infiltration effect of tungsten element is very good.
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Abstract
The invention discloses a method for preparing a tungsten functional coating on a tantalum surface at low temperature. The method comprises the following steps that S1, a base body is subjected to surface polishing treatment and comprises tantalum, a tantalum alloy or a combination of tantalum and the tantalum alloy; S2, the polished base body is embedded into an embedding permeating agent for reacting, wherein the embedding temperature ranges from 240 DEG C to 280 DEG C, the heat preservation time ranges from 1 h to 8 h, the embedding permeating agent comprises WCl6 powder, an activating agent and Al2O3 powder which are evenly dispersed, and the ratio of the WCl6 powder in the embedding permeating agent ranges from 30% to 50% by weight; and S3, after heat preservation is finished, the embedded base body is washed and subjected to vacuum drying. The embedding method is adopted, the base body and the embedding permeating agent generate a diffusion reaction at the temperature ranging from 240 DEG C to 280 DEG C, and therefore the tungsten functional coating is prepared. The base body and the tungsten functional coating are bonded well, the beneficial effect that the functional coating is uniform and compact is achieved, the coating can be obtained without a high temperature or pressurization method, the requirement for equipment is reduced, and the method is suitable for large-scale production.
Description
technical field [0001] The invention relates to the technical field of coating preparation, in particular to a method for preparing a tungsten functional coating on a tantalum surface at a low temperature. Background technique [0002] Tantalum has excellent properties such as high density, high melting point, corrosion resistance, excellent high temperature strength, good processability and weldability, and low plastic / brittle transition temperature, so it is widely used in various industries such as electronics, chemical industry, and weapons. However, tantalum metal is expensive and has poor corrosion resistance in certain atmospheres. Metal tungsten has a very high melting point, boiling point, extremely high strength, hardness, small electron work function and good chemical stability. The metal tungsten coating is prepared on the surface of the tantalum base material, which can be widely used as wear-resistant, corrosion-resistant and heat-shielding materials under hig...
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