Manufacturing method for semiconductor disease chip
A semiconductor and disease technology, which is applied in the manufacture of semiconductor disease chips and the surface functionalization of metal compounds, can solve problems such as weak signals and limited sensitivity of optical detectors
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Embodiment 1
[0041] figure 1 Shown is a structural diagram of a semiconductor disease detection chip, including a metal oxide field effect transistor 1, one or more metal layers 2 connecting the gate of the metal oxide field effect transistor and the detection well, a metal compound layer 3 and an oxide layer 4 And detection well 5.
[0042]First, on the semiconductor wafer, a metal oxide field effect transistor as a sensor is fabricated, and one or more layers of metal are formed on the transistor to connect the gate of the transistor to the metal compound layer, and then an oxide layer is formed on the metal compound layer, And a detection well is formed, the detection well is square, and the side length is greater than 70 μm and less than 120 μm; the detection well can also be circular, and the diameter is greater than 70 μm and less than 120 μm. The metal compound layer is TaO 2 , the oxide film layer 2 is SiO 2 , the oxide thickness is 40 μm.
[0043] After the monoclonal HBeAb is...
Embodiment 2
[0046] Metal compound TaO 2 The method for surface functionalization mainly comprises the following steps:
[0047] 1. Prepare target solution: 15.0mg n-dodecyl diammonium phosphate (DDPO 4 (NH 4 ) 2 ) was dissolved in 5 mL of high-purity water, heated to 50°C, diluted with water to 100 mL, cooled to room temperature and filtered through a 0.22 μm filter to adjust the volume of the solution to 100 mL.
[0048] 2. Growth of monomolecular layer of dodecyl phosphate on the surface: Ultrasonic the chip in ultrapure water and 2-propanol for 15 minutes respectively, blow dry with nitrogen gas, transfer to oxygen plasma cleaning, and immediately transfer to glass vial after 3 minutes , join DDPO 4 (NH 4 ) 2 Solution, soaked for 48h, rinsed with 10mL ultrapure water, and dried with nitrogen.
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