Coupler structure based on BCB bonding technology and production method thereof
A technology of coupling structure and bonding process, which is applied in the field of integrated optoelectronics, can solve the problems of inconvenient production, large size of coupling structure, and difficult coupling efficiency, etc., and achieve the effects of reducing production cost, stable coupling efficiency, and reducing process complexity
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Embodiment 1
[0051] The invention provides a method for manufacturing a coupler structure based on a BCB bonding process, which at least includes the following steps:
[0052] Step S1: providing an SOI substrate, the SOI substrate sequentially includes a silicon substrate, a buried oxide layer and a top layer of silicon from bottom to top;
[0053] Step S2: Etching the top layer of silicon to form a silicon waveguide and a first tapered coupling structure connected to one end of the silicon waveguide; the longitudinal width of the first tapered coupling structure decreases linearly;
[0054] Step S3: forming a BCB cladding layer covering the silicon waveguide and the first tapered coupling structure on the surface of the buried oxide layer, and bonding a III-V family layer structure on the BCB cladding layer;
[0055] Step S4: Etching the III-V group layer structure to form a III-V group optical gain structure and a second tapered coupling structure connected to one end of the III-V group ...
Embodiment 2
[0072] The present invention also provides a coupler structure based on BCB bonding process, please refer to Figure 5 and Image 6 , which are respectively shown as a cross-sectional schematic diagram and a top view of the coupler structure based on the BCB bonding process of the present invention, the coupler structure includes:
[0073] A silicon substrate 1 and a buried oxide layer 2 formed on the silicon substrate 1;
[0074] The silicon waveguide 4 formed on the buried oxide layer 2 and the first tapered coupling structure 5 connected to one end of the silicon waveguide 4; the longitudinal width of the first tapered coupling structure 5 decreases linearly;
[0075] a BCB cladding layer 6 formed on the surface of the buried oxide layer 2 and covering the silicon waveguide 4 and the first tapered coupling structure 5;
[0076] The III-V group optical gain structure 8 formed on the surface of the BCB cladding layer 6 and the second tapered coupling structure 9 connected t...
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