Preparation method for SERS substrate of gold-silver composite nanometer particles

A nanoparticle, gold-silver composite technology, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the impact of SERS activity and repeatability, cannot form nanostructures on a large scale, and affect the field of SERS Application and other issues, to achieve excellent SERS activity, simple and controllable preparation methods, and strong sensitivity

Active Publication Date: 2016-09-07
SHANGHAI JIAO TONG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method has many disadvantages: nanoparticles are easy to aggregate, and it is impossible to form relatively ordered nanostructures on a large scale, so the SERS activity and repeatability are greatly affected and limited.
Although this technology can produce a ring-packed nano-gold-silver composite structure, but because it is prepared in a colloid, it is very easy to aggregate during the later separation and assembly on the substrate surface, which will seriously affect the application in the field of SERS.

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  • Preparation method for SERS substrate of gold-silver composite nanometer particles

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Embodiment 1

[0034] This embodiment provides a method for preparing a SERS substrate based on a co-sputtering method and a displacement method for preparing gold-silver composite nanoparticles, the method comprising the following steps:

[0035] a. Add 10ml of concentrated hydrochloric acid into a clean and dry round bottom flask, then put the cut silicon chip (1×1cm) into the concentrated hydrochloric acid, stir evenly at 100°C for 2 hours at a stirring speed of 80r / min; concentrated hydrochloric acid Concentrated hydrochloric acid is generally defined, that is, hydrochloric acid with a mass fraction exceeding 37%.

[0036] b. Take out the silicon wafer with clean tweezers, rinse it with alcohol and deionized water in turn, and dry it naturally for later use (cleaning the oil and other impurities on the surface of the silicon wafer will help the sputtered nanoparticle film to better adhere to on the base);

[0037] c. Put the clean silicon wafer into the sputtering chamber of the magnetr...

Embodiment 2

[0042] This embodiment provides a method for preparing a SERS substrate based on a co-sputtering method and a displacement method for preparing gold-silver composite nanoparticles, the method comprising the following steps:

[0043] a. Add 10ml of concentrated hydrochloric acid into a clean and dry round bottom flask, then put the cut silicon chip (1×1cm) into concentrated hydrochloric acid, stir evenly at 90°C for 1 hour, stirring speed 100r / min; concentrated hydrochloric acid Concentrated hydrochloric acid is generally defined, that is, hydrochloric acid with a mass fraction exceeding 37%.

[0044] b. Take out the silicon wafer with clean tweezers, rinse it with alcohol and deionized water in turn, and dry it naturally for later use;

[0045] c. Put the clean silicon wafer into the sputtering chamber of the magnetron sputtering system, start vacuuming and make the sputtering chamber pressure reach 10 -5 Pa;

[0046] d. the zinc target power is set to 20W, the silver target...

Embodiment 3

[0050] This embodiment provides a method for preparing a SERS substrate based on a co-sputtering method and a displacement method for preparing gold-silver composite nanoparticles, the method comprising the following steps:

[0051] a. Add 10ml of concentrated hydrochloric acid into a clean and dry round bottom flask, then put the cut silicon chip (1×1cm) into the concentrated hydrochloric acid, stir evenly at 80°C for 2 hours, and the stirring speed is 100r / min; concentrated hydrochloric acid Concentrated hydrochloric acid is generally defined, that is, hydrochloric acid with a mass fraction exceeding 37%.

[0052] b. Take out the silicon wafer with clean tweezers, rinse it with alcohol and deionized water in turn, and dry it naturally for later use;

[0053] c. Put the clean silicon wafer into the sputtering chamber of the magnetron sputtering system, start vacuuming and make the sputtering chamber pressure reach 10 -4 Pa;

[0054] d. the zinc target power is set to 30W, t...

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Abstract

The invention provides a preparation method for a SERS substrate of gold-silver composite nanometer particles. The method comprises the following steps: carrying out co-sputtering composite coating of metallic zinc and silver on the surface of silicon chip by using a magnetron sputtering system; and then soaking the silicon chip in an auric chloride acid solution so as to form gold-silver nanometer particles through a displacement method. Thus, a composite structure of the gold-silver nanometer particles is formed on the silicon chip substrate, and the reproducible SERS substrate with a high enhancement factor is prepared. The prepared SERS active substrate in the invention has the advantages of high controllability, good reproducibility, a great enhancement factor and the like and shows good capability in detecting micromolecules (such as glycerin).

Description

technical field [0001] The invention relates to the application field of nanomaterials, in particular to a method for preparing a SERS substrate for preparing gold-silver composite nanoparticles based on a co-sputtering method and a replacement method. Background technique [0002] Due to the advantages of no sample pretreatment, easy operation, fast detection speed, and high accuracy in SERS spectrum detection, coupled with the development of laser technology, it has quickly become a powerful analytical tool in the fields of analytical science, environmental science, and biological science. tool. However, the application of SERS largely depends on how to obtain a SERS substrate with uniform signal and high activity. [0003] So far, people have developed a variety of SERS substrate preparation methods, such as gold and silver nanoparticles surface self-assembly method [Jia P, Cao B, Wang J, et al. Self-assembly of various silvernanocrystals on PmPD / PAN nanofibers as a hi...

Claims

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Application Information

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IPC IPC(8): G01N21/65B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00G01N21/658
Inventor 何丹农张彦鹏尹桂林卢静
Owner SHANGHAI JIAO TONG UNIV
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