Photovoltaic cell and preparation method thereof

A photovoltaic cell and electrode technology, applied in photovoltaic power generation, circuits, electrical components, etc., can solve problems such as silicon-based batteries with high production cost efficiency

Inactive Publication Date: 2016-09-07
ZHEJIANG JINKO SOLAR CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, high production cost and low efficiency have always been the factors that plague the development of silicon-based batteries, which are still far from t

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  • Photovoltaic cell and preparation method thereof

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preparation example Construction

[0032] The present invention also provides a method for preparing the above-mentioned photovoltaic cell, comprising:

[0033] performing reactive ion etching on one side of the P-type substrate to obtain a reactive ion etching textured layer;

[0034] Diffusion is carried out in the reactive ion etching textured layer to form a PN junction layer;

[0035] Grooving is performed on the surface of the PN junction layer, and then coating is performed to form an anti-reflection film layer;

[0036] Printing electrode paste on the surface of the anti-reflection film layer to form grid line electrodes;

[0037] The back electrode paste is printed on the surface opposite to the contact surface of the P-type substrate and the reactive ion etching texture layer to form a back electric field and a back electrode.

[0038] Wherein, the P-type substrate, the reactive ion etching texture layer, the PN junction layer, the anti-reflection film layer, the grid line electrode, the back electr...

Embodiment 1

[0050] 1.1 Choose 156x156mm polysilicon wafers, the thickness of which is within the range of 210±10μm; clean the silicon wafers before making texture, remove the loss layer and impurities of the original sheet itself, and form a texture layer; the thinning amount is controlled between 0.25 ~ 0.35g .

[0051] 1.2 Put the multi-wafer prepared above into the RIE equipment for reactive ion dry etching to form a reactive ion etching texture layer with a circular hole diameter of 200-500 μm, in which Cl 2 The gas flow is controlled between 400 and 1200 sccm; O 2 The gas flow is controlled between 900 and 2000 sccm; SF 6 The gas input and output flow rates are 600-700sccm and 500-650sccm respectively, the reaction time is 3-5s, the reaction pressure is 24pa, and the power range is between 1000-2000W; the battery is black.

[0052] 1.3 Put the multi-wafer that has been dry-etched into the cleaning equipment for repair. The process is first HF pickling for 120s-deionized water washi...

Embodiment 2

[0060] 2.1 Select 156x156mm polysilicon wafers, the thickness of which is within the range of 210±10μm; the silicon wafers are pre-cleaned and textured to remove the loss layer and impurities of the original wafer itself to form a textured layer; the thinning amount is 0.25g.

[0061] 2.2 Put the multi-wafer prepared above into the RIE equipment for reactive ion dry etching to form a reactive ion etching texture layer with a circular hole diameter of 200-500 μm, in which Cl 2 The flow rate of gas is between 400sccm input and 1200sccm outflow; O 2 Gas flow control is 900sccm; SF 6 The input and output flow rates of the gas are between 600-700sccm and 500-650sccm respectively, the reaction time is 3sec, the reaction pressure is 24pa, and the power range is between 1000W; the battery is black; after this process, the reflectance is measured 9%.

[0062] 2.3 Put the above-mentioned dry-etched multi-chip into the cleaning equipment for repair, the process is first HF pickling for...

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Abstract

The invention provides a photovoltaic cell, which is characterized in comprising a back electrode, a back electric field, a P-type substrate, a reaction ion etching texture layer, a PN node layer, an antireflection film layer and a grid line electrode, wherein the back electrode, the back electric field, the P-type substrate, the reaction ion etching texture layer, the PN node layer, the antireflection film layer and the grid line electrode are successively arranged from bottom to top; one surface, which is in contact with the antireflection film layer, of the PN node layer is provided with a plurality of parallel grooves; and the PN node layer and the antireflection film layer are in continuous contact. Compared with the prior art, the photovoltaic cell firstly utilizes reactive ion etching to change a battery texture structure and improve the adsorption rate of photons, and a battery conversion effect is improved through the reduction of the incident light loss of the battery; secondly, laser grooving is carried out after the PN node layer is formed through diffusion on the optimized surface of the optimized battery, the battery morphology obtained after grooving can more effectively enhance adsorption on sunlight, a battery grid line and the optimized battery texture can better form Ohmic contact since a photon refraction process is added, so that the collection and the output of photon-generated carriers can be improved so as to improve the short circuit current and the open circuit voltage of the battery.

Description

technical field [0001] The invention belongs to the technical field of batteries, and in particular relates to a photovoltaic battery and a preparation method thereof. Background technique [0002] Solar energy is one of the energy sources developed at home and abroad. It uses photovoltaic cells to absorb the sun's light energy and convert it into electrical energy. It has great potential and prospects to replace traditional energy sources. Among various solar cells, silicon-based solar cells account for 90% of the total market share. However, high production cost and low efficiency have always been the factors that plague the development of silicon-based batteries, which are still far from traditional petrochemical energy sources. Therefore, improving the conversion efficiency of solar cells and reducing production costs are huge challenges we face. Among them, improving the textured structure of solar cells and improving the conversion efficiency of the cells is also an e...

Claims

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Application Information

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IPC IPC(8): H01L31/0216H01L31/0236H01L31/18
CPCH01L31/02168H01L31/02363Y02E10/50Y02P70/50
Inventor 王成金井升蒋方丹金浩
Owner ZHEJIANG JINKO SOLAR CO LTD
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