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Novel compound and coloring photosensitive composition

A photosensitive composition and compound technology, applied in optics, filters, optical elements, etc., can solve the problems of unsatisfactory solvent resistance and heat resistance, and achieve excellent waveform controllability, solvent resistance and Excellent heat resistance effect

Active Publication Date: 2019-07-05
ADEKA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the compounds having polymerizable groups described in these documents are not satisfactory in terms of solvent resistance and heat resistance.

Method used

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  • Novel compound and coloring photosensitive composition
  • Novel compound and coloring photosensitive composition
  • Novel compound and coloring photosensitive composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0178] The synthesis of embodiment 1. compound No.13, No.25, No.26 and No.35

[0179]

[0180] 0.01 mol of the following compound S-1, 0.02 mol of monoethylaminophenol, and 0.03 mol of sulfuric acid were mixed, and stirred at 140° C. for 8 hours. The reaction solution was added dropwise to an aqueous sodium hydroxide solution, the organic matter was extracted with toluene, and after washing with water three times, the solvent was distilled off from the organic layer. The residue was purified by silica gel chromatography (developing solvent: chloroform) to obtain 0.005 mol of a colorless product (52% yield).

[0181] (Compound S-1)

[0182]

[0183]

[0184] 2.56 g (0.005 mol) of the colorless substance obtained in step 1, 19.75 g of water, and 3.95 g of hydrochloric acid were added, and after stirring, 9.27 g of a 35% by mass ferric chloride aqueous solution was added, and stirred at 80° C. for 8 hours. After cooling to room temperature, chloroform was added, the aque...

Embodiment 2 and comparative example 2

[0190] Example 2 and Comparative Example 2. Preparation of Colored Alkali Developable Photosensitive Composition

[0191] Preparation of Alkali Developable Photosensitive Composition

[0192] 30.33 g of ACA Z251 (manufactured by Daicel-Cytec Co., Ltd.) and 11.04 g of Aronix M-450 (manufactured by Toagosei Co., Ltd.) as (B) component, and 1.93 g of IRGACURE 907 (manufactured by BASF Co., Ltd.) as (C) component, as ( 20.08 g of PGMEA of E) component, and 0.01 g of FZ2122 (made by Toray-Dow Corning) which are other components were mixed, and it stirred until the insoluble matter disappeared, and obtained the alkali-developing photosensitive composition.

[0193] Preparation of dye solution

[0194] 0.10 g of the compounds described in Table 3 and 1.90 g of PGMEA were added as (A) component, respectively, and they were stirred and dissolved, and it was set as dye liquid No.1-No.2 and comparison dye liquid No.1-No.2.

[0195] Preparation of Colored Alkali Developable Photosens...

Embodiment 3 and comparative example 3

[0200] Example 3 and Comparative Example 3. Heat resistance evaluation by firing

[0201] Colored alkali-developable photosensitive compositions No.1 and No.2 obtained in Example 2 and comparative colored alkali-developable photosensitive compositions No.1 and No.2 obtained in Comparative Example 2 were respectively prepared at 410 rpm×7 Second conditions were applied on a glass substrate, and dried on a hot plate (90° C., 90 seconds). Gained coating film utilizes ultra-high pressure mercury lamp to expose (150mJ / cm 2 ). The coating film after exposure was baked on the condition of 230 degreeC x 30 minutes. The color difference (ΔEab*) before and after firing was investigated. The better the heat resistance, the higher the value of the color difference. The results are shown in Table 4.

[0202] Table 4

[0203] compound (dye) Color difference△Eab* Evaluation example 1-1 Compound No.25 1.74 Evaluation example 1-2 Compound No.26 1.50 Com...

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Abstract

The present invention provides a novel compound suitable for dyes that is excellent in solvent resistance and heat resistance, and further excellent in waveform control in the light absorption spectrum, and a colored photosensitive composition (colored alkali-developable photosensitive composition) using the compound (dye). composition) and a color filter, wherein a compound represented by the following general formula (1) is used as a dye, especially R in the general formula (1) 4 and R 7 A compound wherein either one or both of them is a hydroxyl group, a halogen atom, an alkyl group having 1 to 8 carbon atoms substituted by a halogen atom, or an alkoxy group having 1 to 8 carbon atoms which may be substituted by a halogen atom. The specific content of general formula (1) is as described in this specification.

Description

technical field [0001] The present invention relates to novel compounds suitable for dyes designed to have a desired hue, having good performance as a light absorber, and having improved heat resistance. The present invention also relates to an energy-ray-polymerizable colored photosensitive composition using the dye, and a color filter using the colored photosensitive composition. Background technique [0002] Compounds that absorb specific light with high intensity are used as recording layers of optical recording media such as CD-R, DVD-R, DVD+R, and BD-R, or as liquid crystal display devices (LCD), plasma display panels (PDP) , Electroluminescent Display (ELD), Cathode Tube Display (CRT), Fluorescent Display Tube, Field Emission Display and other optical components of image display devices. [0003] Optical filters for image display devices such as liquid crystal display (LCD), plasma display panel (PDP), electroluminescence display (ELD), cathode tube display (CRT), fl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09B69/02C09B11/28C09B67/20G02B5/20G03F7/004
CPCC09B11/14C09B11/24C09B11/28G02B5/223G03F7/0007G03F7/027G03F7/105C09B69/02G03F7/004G03F7/028
Inventor 久保田裕介小田祐史
Owner ADEKA CORP
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