Preparation method of electronic-grade ultrafine composite silica micropowder for integrated circuit substrate
An integrated circuit-based, silicon micropowder technology, applied in the direction of circuit substrate materials, circuits, printed circuits, etc., to achieve the effects of improving compatibility, benefiting human health and environmental protection, and reducing production costs
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Embodiment 1
[0025] Embodiment 1, a preparation method of electronic-grade ultrafine composite silicon micropowder for integrated circuit substrate, the steps are as follows:
[0026] (1) Add fused silica micropowder with silicon dioxide content of more than 99.7%, particle size D50=3.6±0.3μm, D100≤14μm, add 150kg each time into a high-speed mixer, stir at high speed and heat up for 5 minutes, and then add emulsifying dispersant Hexa 450ml of base disilazane was stirred at high speed for 5min, the material was discharged through an 80-mesh vibrating screen, and passed through a 10,000Gs magnetic separator to remove metal impurities, and component A was prepared for use;
[0027] (2) Add the two products of 4-70 mesh alkali-free glass sand and alkali-free glass flakes with a length of not more than 0.50cm in a mass ratio of 1:2, at a feeding frequency of 6HZ, into a continuous running ball mill, and the grinding medium in the ball mill is: Alumina balls, the ratio is: ¢38:¢32:¢19=8:12:10, t...
Embodiment 2
[0029] Embodiment 2, a preparation method of electronic-grade ultrafine composite silicon micropowder for integrated circuit substrate, the steps are as follows:
[0030] (1) Add fused silica micropowder with silicon dioxide content of more than 99.7%, particle size D50=3.6±0.3μm, D100≤14μm, add 180kg each time into a high-speed mixer, stir at high speed and heat up for 5-10min, and then add emulsifying dispersant 550ml of hexamethyldisilazane was stirred at high speed for 10min, the material was discharged through an 80-mesh vibrating screen, and passed through a 10000Gs magnetic separator to remove metal impurities, and component A was prepared for use;
[0031] (2) Add the two products of 4-70 mesh alkali-free glass sand and alkali-free glass flakes with a length of not more than 0.50cm in a mass ratio of 1:2 and a feeding frequency of 10HZ into a continuous running ball mill. The grinding medium in the ball mill is: Alumina balls, the ratio is: ¢38:¢32:¢19=8:12:10, the tot...
Embodiment 3
[0033] Embodiment 3, a preparation method of electronic-grade ultrafine composite silicon micropowder for integrated circuit substrate, the steps are as follows:
[0034] (1) Add fused silica micropowder with silicon dioxide content of more than 99.7%, particle size D50=3.6±0.3μm, D100≤14μm, add 165kg each time into a high-speed mixer, stir at a high speed for 5-10min, and then add an emulsifying dispersant 500ml of hexamethyldisilazane was stirred at high speed for 8min, the material was discharged through an 80-mesh vibrating screen, and passed through a 10000Gs magnetic separator to remove metal impurities, and component A was prepared for use;
[0035] (2) Add the two products of 4-70 mesh alkali-free glass sand and alkali-free glass flakes with a length of not more than 0.50cm in a mass ratio of 1:2 and a feeding frequency of 8HZ into a continuous running ball mill. The grinding medium in the ball mill is: Alumina balls, the ratio is: ¢38:¢32:¢19=8:12:10, the total weight...
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