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Process for producing antistatic TFT substrate

A production process, anti-static technology, applied in the direction of circuits, electrical components, electric solid devices, etc., can solve the problem of poor anti-static effect of TFT-type liquid crystal display, easy detachment of anti-static film, surface oxides, glue, oil stains, etc. Problems such as excessive dust residue

Active Publication Date: 2017-01-25
WGTECH JIANGXI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since this kind of TFT substrate has not been thinned, there are many residual oxides, glue, oil stains, and dust on the surface. After the antistatic film is directly processed on the TFT substrate, the antistatic film is easy to fall off, resulting in the antistatic effect of the TFT liquid crystal display. Ineffective

Method used

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  • Process for producing antistatic TFT substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0054] The edge of the TFT substrate to be treated is sealed and protected with UV glue, and then the UV glue is cured. The thickness of the TFT substrate is 1 mm. Put the sealed TFT substrate into a UV curing machine at a temperature of 60 ° C. Use ultraviolet rays to irradiate the TFT substrate with UV glue and UV glue for 30 minutes.

[0055] Use a dust-free cloth dipped in acetone to wipe on the surface of the cured TFT substrate to remove the UV glue remaining on the surface of the cured TFT substrate.

[0056] The sealed TFT substrate is sequentially subjected to acid solution treatment, first water washing, alkaline solution treatment and second water washing. The TFT substrate was placed in an acid tank containing a mixed solution of 70% sulfuric acid solution and 30% hydrofluoric acid solution (volume ratio 600:1), soaked for 60min, and the temperature was 30°C. There is a bubbling tube at the bottom of the acid tank, the bubbling makes the pickling accelerated and u...

Embodiment 2

[0063] The edge of the TFT substrate to be treated is sealed and protected with UV glue, and then the UV glue is cured. The thickness of the TFT substrate is 1.4 mm. Put the glue-sealed TFT substrate into a UV curing machine at a temperature of 55 ° C. Use ultraviolet rays to irradiate the TFT substrate with UV glue and UV glue for 25 minutes.

[0064] Use a dust-free cloth dipped in acetone to wipe on the surface of the cured TFT substrate to remove the UV glue remaining on the surface of the cured TFT substrate.

[0065] The sealed TFT substrate is sequentially subjected to acid solution treatment, first water washing, alkaline solution treatment and second water washing. The TFT substrate was placed in an acid tank containing a mixed solution of 70% sulfuric acid solution and 30% hydrofluoric acid solution (volume ratio 300:1), soaked for 70 minutes, and the temperature was 25°C. The bottom of the acid tank is equipped with a bubbling tube, the bubbling makes the pickling ...

Embodiment 3

[0072] The edge of the TFT substrate to be treated is sealed and protected with UV glue, and then the UV glue is cured. The thickness of the TFT substrate is 1.2mm. Put the sealed TFT substrate into a UV curing machine at a temperature of 58°C. Use ultraviolet rays to irradiate the TFT substrate with UV glue and the UV glue for 28 minutes.

[0073] Use a dust-free cloth dipped in acetone to wipe on the surface of the cured TFT substrate to remove the UV glue remaining on the surface of the cured TFT substrate.

[0074] The sealed TFT substrate is sequentially subjected to acid solution treatment, first water washing, alkaline solution treatment and second water washing. The TFT substrate was placed in an acid tank containing a mixed solution of 70% sulfuric acid solution and 30% hydrofluoric acid solution (volume ratio 1000:1), soaked for 50 minutes, and the temperature was 28°C. There is a bubbling tube at the bottom of the acid tank, the bubbling makes the pickling accelera...

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Abstract

The invention relates to a process for producing an antistatic TFT substrate. The process comprises the following steps: performing sealing protection on the edge of a TFT substrate with UV adhesive, and curing the UV adhesive; wiping the cured TFT substrate with a UV adhesive dissolving agent; sequentially performing acid solution treatment, first time of rinsing, alkali solution treatment and second time of rinsing on the sealed TFT substrate; sequentially performing third time of rinsing, cleaning solution cleaning, two-fluid spraying, ultrafine water spraying, high-pressure spraying, cold air drying and hot air drying on the acid-pickled TFT substrate; performing magneto-sputtering deposition on the to-be-plated TFT substrate to form an ITO film so as to obtain the antistatic TFT substrate. According to the process for producing the antistatic TFT substrate, the TFT substrate is subjected to acid solution treatment before an antistatic film is plated, so that impurities on the surface of the TFT substrate can be removed, the quality of the antistatic film in the antistatic TFT substrate after film plating can be improved, and the antistatic effect can be improved.

Description

technical field [0001] The invention relates to the technical field of substrates, in particular to a production process of an antistatic TFT substrate. Background technique [0002] At present, display screens containing TFT (Thin-Film Transistor, Thin Film Field Effect Transistor) substrates have become mainstream display devices for various electronic devices, mainly because display screens containing TFT substrates have advantages such as high responsiveness, high brightness, and high contrast. [0003] When the TFT liquid crystal display is used in navigators and vehicles, the TFT liquid crystal display needs to have strong stress to achieve the effect of shockproof and anti-collision, so the thickness of the TFT substrate in the TFT liquid crystal display is generally Between 1mm and 1.4mm. Since this kind of TFT substrate has not been thinned, there are many residual oxides, glue, oil stains, and dust on the surface. After the antistatic film is directly processed on...

Claims

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Application Information

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IPC IPC(8): H01L21/77H01L27/12
CPCH01L27/1259
Inventor 张迅易伟华张伯伦
Owner WGTECH JIANGXI
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