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Photoresist developer

A developing solution and photoresist technology, applied in optics, photography, opto-mechanical equipment, etc., can solve problems such as reduced developability, liquid crystal alignment problems, air bubbles, etc., to achieve less damage to fine patterns, and reduce residual and air bubbles. amount of effect

Active Publication Date: 2017-02-15
ENF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned existing developer will still be adsorbed on the surface of the photoresist and remain, which will cause defects such as liquid crystal alignment problems or image sticking during pixel driving, and in sputtering (spray) type processes, etc. In the middle, there may be problems such as bubbles, so there is a problem that the developability is reduced.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to 8 and comparative example 1 to 4

[0052] Embodiment 1 to 8 and comparative example 1 to 4: the manufacture of photoresist developing solution

[0053] The components and contents described in the following Table 1 were mixed to prepare a photoresist developing solution. The remaining amount of water was added so that the total weight of the composition would be 100 parts by weight.

[0054] 【Table 1】

[0055]

[0056]

[0057] BPA-16: Add 16 moles of ethylene oxide to 1 mole of bisphenol A (SUNFOL BPA-16, SFC company)

[0058] BPA-18: Add 18 moles of ethylene oxide to 1 mole of bisphenol A (SUNFOL BPA-18, SFC Company)

[0059] DPA-14: Add 14 moles of ethylene oxide to 1 mole of 4,4'-methylene diphenol (SUNFOLDPA-14, SFC company)

[0060] BPA-20E2P: Add 20 moles of ethylene oxide and 2 moles of propylene oxide to 1 mole of bisphenol A (SUNFOL BPA-20E2P, SFC Company)

[0061] PCP-8: Add 8 moles of ethylene oxide (SUNFOL PCP-8, SFC company) to 1 mole of p-cumyl phenol (para-cumyl phenol)

[0062] MSP-9...

experiment example 1

[0068] Experimental example 1) Surfactant residual content analysis

[0069] On the glass substrate (100mm×100mm) used in the alkali-free TFT-LCD, negative photoresist (Red color photoresist, LED1R, LG Chemical Company) with a film thickness of 1.2-1.5 μm was spin-coated. Front exposure (42mJ / cm 2 ), the developing solutions involved in the respective examples and comparative examples in Table 1 above were diluted to 100 times with water. The substrate was treated with an aqueous ethanol solution having a concentration of 80% by weight, and after the surface of the color resist was extracted, the residual amount of the surfactant in the aqueous ethanol solution was measured by liquid chromatography.

experiment example 2

[0070] Experimental Example 2) Confirmation of the photoresist pattern after development

[0071] On the glass substrate (100mm × 100mm) used in the alkali-free TFT-LCD, the negative photoresist (resin black matrix, TOK5110, TOK company) with a film thickness of 1.2-1.5 μm is spin-coated, and heated in an oven at 100 ° C A 100 second pre-bake was performed. Then use a pattern mask to expose (79mJ / cm 2 ), the developing solutions involved in the respective examples and comparative examples in Table 1 above were diluted to 100 times with water. After the developer treatment, it was washed with ultrapure water for a certain period of time, rinsed, air-dried with nitrogen, and then hard-baked in an oven at 220° C. for 20 minutes. The pattern of the photoresist with a width of 1 to 40 μm was observed with an optical microscope, and the degree of damage and loss of the pattern was confirmed.

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Abstract

The photoresist developer according to the present invention comprises a nonionic surfactant having a specific structure and an alkali source, and is capable of maintaining the development of fine patterns and reducing the occurrence of after-image and bubbles caused by the residue of compounds during the development process. This invention relates to a photoresist developer, and more particularly, to a photoresist developer which is capable of improving the workability when developing a negative color photoresist for forming an array of color filters. The disclosed photoresist developing is characterized by comprising a nonionic surfactant represented by the following chemical Formula 1 and an alkali source.

Description

technical field [0001] The present invention relates to a photoresist developer (Photoresist developer), and more specifically relates to the process of developing a negative photoresist microresist (Negative photoresist) to form a color filter (Color filter) array, etc., which can improve engineering photoresist developer. Background technique [0002] Generally, color filters used in liquid crystal display units and the like are manufactured using negative photoresists. The following methods can be used: after forming a pattern based on a photosensitive resin composition, the pattern is dyed; Voltage, a method of ionizing a composition containing a dispersed pigment; a method of dispersing an ink containing a heat-curable or photo-curable composition; or forming a pattern using a photosensitive composition in which a pigment is dispersed, etc. Wait. [0003] In the above-mentioned development process for forming color filters, alkaline developers such as potassium hydrox...

Claims

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Application Information

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IPC IPC(8): G03F7/32
CPCG03F7/322
Inventor 郑玄铁李相大丁镇培
Owner ENF TECH
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