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Preparation method of nano array solar battery

A nano-array and solar cell technology, applied in the field of solar modules, can solve the problems of reducing photoelectric conversion efficiency, reducing the life of photo-generated carriers, and accelerating the recombination of photo-generated carriers, so as to improve photoelectric conversion efficiency, increase electron collection ability, Effect of improving photon utilization efficiency

Inactive Publication Date: 2017-05-31
RENESOLA JIANGSU LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Traditionally prepared nanoarrays have a high specific surface area. A large number of defects and suspension bonds on the surface of nanoarrays accelerate the recombination of photogenerated carriers and reduce the output of photogenerated currents. Forming a large-area nano-array, this nano-array containing a large number of recombination centers does not exert its light-limiting effect, but reduces the lifetime of photo-generated carriers and greatly reduces the photoelectric conversion efficiency.

Method used

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  • Preparation method of nano array solar battery

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Embodiment 1

[0031] The preparation method of the nano-array solar cell of the present embodiment comprises the following steps:

[0032] (1) De-damaging and texturing of the silicon wafer surface: place the silicon wafer in an aqueous solution of nitric acid, hydrofluoric acid, and texturing additives, and the texturing time is 0.8 minutes; The volume ratio of 40%, 11%, 0.3% is mixed, and the concentrations of nitric acid, hydrofluoric acid and texturing additives are the same.

[0033] (2) Preparation of silicon wafer surface corrosion mask: use printing method to print negative polarity photoresist on the textured silicon wafer to prepare a surface corrosion mask, and the area 1 of the surface corrosion mask is as follows figure 1 As shown in , the thickness of the surface etching mask is 0.3 μm, and the width of the surface etching mask is 1.3 mm;

[0034] (3) Metal ion wet chemical catalytic corrosion nano-array preparation: the nano-array was prepared by hydrofluoric acid and silver...

Embodiment 2

[0043] The preparation method of the nano-array solar cell of the present embodiment comprises the following steps:

[0044] (1) De-damaging and texturing of the silicon wafer surface: place the silicon wafer in an aqueous solution of nitric acid, hydrofluoric acid, and texturing additives, and the texturing time is 0.8 minutes; The volume ratio of 40%, 11%, 0.3% is mixed, and the concentrations of nitric acid, hydrofluoric acid and texturing additives are the same.

[0045] (2) Preparation of silicon wafer surface corrosion mask: use printing method to print negative polarity photoresist on the textured silicon wafer to prepare a surface corrosion mask, and the area 1 of the surface corrosion mask is as follows figure 1 As shown in , the thickness of the surface etching mask is 0.3 μm, and the width of the surface etching mask is 1.3 mm;

[0046] (3) Metal ion wet chemical catalytic corrosion nano-array preparation: the nano-array was prepared by hydrofluoric acid and silver...

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Abstract

The invention relates to a preparation method of a nano array solar battery. The preparation method comprises the following steps: (1) damage removal and texturing on the surface of a silicon wafer; (2) preparation of an etching mask on the surface of the silicon wafer, wherein the thickness of the mask is 0.1 to 2 microns, and the width of the mask is 1.0 to 3 mm; (3) metal ion wet chemocatalysis corrosion nano array preparation; (4) removal of the etching mask on the surface of the silicon wafer; (5) diffusion preparation of PN junctions; (6) preparation of an anti-reflection film; (7) silk-screen printing metallization; and (8) coating of an ice-coating withstanding adhered emulsion. According to the preparation method of the nano array solar battery disclosed by the invention, the prepared nano array solar battery has relatively low surface reflectivity in areas outside main grid lines, so that more photons are incident into the silicon wafer, and the utilization rate of the photons is improved; and moreover, the electron collecting capacity of main grid line areas of the battery is improved, and the utilization rate of the photons outside the main grid line areas is improved, so that the photoelectric conversion efficiency of the whole battery is improved.

Description

technical field [0001] The invention relates to a preparation method of a nano-array solar cell, which belongs to the technical field of solar modules. Background technique [0002] Solar cells originated from the crystalline silicon solar cell technology in the 1980s. After 30 years of accumulation and improvement, this technology has been successfully applied to the production of large-scale crystalline silicon solar cells. The breakthrough in the total installed capacity of photovoltaic power generation in the world has benefited from the excellent wet process solutions provided by companies such as RENA and SCHMID. These are suitable for the light-limiting structural scheme of the wet chemical method of crystalline silicon wafers, and meet the needs of large-scale production of crystalline silicon photovoltaic cells. [0003] The traditional metal ion catalyzed wet chemical method for preparing nanoarrays mainly has the following shortcomings: [0004] Traditionally pr...

Claims

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Application Information

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IPC IPC(8): H01L31/18H01L31/0216B82Y40/00
CPCB82Y40/00H01L31/02167H01L31/02168H01L31/1804Y02E10/547Y02P70/50
Inventor 宋令枝朱琛张子森赫汉胡欢欢
Owner RENESOLA JIANGSU LTD
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