Etching solution composition, array substrate for display device and manufacturing method thereof

A technology for array substrates and display devices, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of inability to lengthen the service period of the etching solution, reduce the accuracy and efficiency of the process, and slow the etching speed of the etching solution. Small taper angle variation, efficient etching process, and excellent etching speed
CN106835138BActive Publication Date: 2019-02-19DONGWOO FINE CHEM CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
DONGWOO FINE CHEM CO LTD
Publication Date
2019-02-19

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Abstract

The invention relates to an etchant composition, an array substrate for a display device, and a manufacturing method thereof. More specifically, the invention relates to an etchant composition for a copper-based metal film, including hydrogen peroxide, fluorine compound, 5-methyl-1H-tetrazole, a water soluble compound in which one molecule has a nitrogen atom and hydroxy, sodium tripolyphosphate / disulfate, polyols type surfactant, and water with certain contents, an array substrate for a display device by employing the above etchant composition, and a manufacturing method thereof.
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Description

technical field

[0001] The present invention relates to a method for manufacturing an array substrate for a display device, and more specifically, relates to an etchant composition for a copper-based metal film, an array substrate for a display device using the above etchant composition, and a method for manufacturing the same. Background technique

[0002] In a semiconductor device, the process of forming metal wiring on a substrate generally includes steps using the following processes: a metal film forming process using sputtering or the like; photoresist coating, exposure, and development in selected areas using light; A resist formation process; and an etching process, including cleaning processes before and after individual unit processes, and the like. Such an etching step means a step of leaving a metal film on a selected region by using a photoresist as a mask, and generally, dry etching using plasma or the like or wet etching using an etchant composition is used. ...

Claims

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