GaN based laser device and preparation method thereof
A technology of lasers and confinement layers, which is applied to lasers, laser components, semiconductor lasers, etc., can solve problems affecting optical power and slope efficiency, affecting optical confinement, and effective barriers of electronic blocking layers, so as to reduce optical loss and effectively Potential barrier enhancement, effect of increasing optical power and slope efficiency
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[0028] In an exemplary embodiment of the present invention, a method for manufacturing a GaN-based violet laser is provided. figure 1 It is a schematic structural diagram of a GaN-based violet laser according to an embodiment of the present invention. Such as figure 1 Shown, the preparation method of GaN-based violet laser of the present invention comprises the following steps:
[0029] S1: On the gallium nitride substrate 10, the n-type confinement layer 11, the lower waveguide layer 12, the quantum well active region 13, the composite upper waveguide layer 14, the p-type electron blocking layer 15, p-type confinement layer 16, p-type ohmic contact layer 17;
[0030] S2: Dry etching the p-type ohmic contact layer 17, the p-type confinement layer 16, the p-type electron blocking layer 15 and the composite upper waveguide layer 14 into a laser ridge shape;
[0031] S3: growing an oxide film on the formed ridge, and fabricating a p-type ohmic electrode 18 by photolithography;...
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