High-performance helmet used for electric system outdoor maintenance and manufacturing method thereof
A technology of a power system and a manufacturing method, applied in the field of machinery
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[0065] Example 1:
[0066] The helmet component 10, the electrochromic device 20 and the adjuster 30 are assembled.
[0067] Making the electrochromic device 20 includes:
[0068] (1)WO 3 Preparation of nano-film 5 material electrochromic electrode:
[0069] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film 2 on the surface of tempered glass 1 of a specific size, the thickness is about 320nm;
[0070] b. Perform high-temperature annealing treatment on it to obtain FTO conductive glass with higher strength, and then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for use; then, use the magnetron sputtering method Plating W film on FTO glass with a thickness of 220nm; W film is used as WO 3 The growth source of nanowires;
[0071] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, and then add 3mol / L hydrochloric acid dropwise until no precipitation occurs. The precipitate is washed by centrifug...
Example Embodiment
[0085] Example 2:
[0086] The helmet component 10, the electrochromic device 20 and the adjuster 30 are assembled.
[0087] Making the electrochromic device 20 includes:
[0088] (1)WO 3 Preparation of nano-film 5 material electrochromic electrode:
[0089] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film 2 on the surface of tempered glass 1 of a specific size, the thickness is about 360nm;
[0090] b. Perform high-temperature annealing treatment on it to obtain FTO conductive glass with higher strength, and then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for use; then, use the magnetron sputtering method Plating W film on FTO glass with a thickness of 200nm; W film is used as WO 3 The growth source of nanowires;
[0091] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, and then add 3mol / L hydrochloric acid dropwise until no precipitation occurs. The precipitate is washed by centrifug...
Example Embodiment
[0105] Example 3:
[0106] The helmet component 10, the electrochromic device 20 and the adjuster 30 are assembled.
[0107] Making the electrochromic device 20 includes:
[0108] (1)WO 3 Preparation of nano-film 5 material electrochromic electrode:
[0109] a. Magnetron sputtering fluorine-doped tin oxide (FTO) film on the surface of tempered glass 1 of specific size, the thickness is about 340nm;
[0110] b. Perform high-temperature annealing treatment on it to obtain FTO conductive glass with higher strength, and then ultrasonically clean the FTO conductive glass for 15 minutes in the order of ultrapure water, acetone, and ethanol, and dry it for use; then, use the magnetron sputtering method Plating W film on FTO glass with a thickness of 210nm; W film is used as WO 3 The growth source of nanowires;
[0111] c. Prepare a 0.2mol / L sodium tungstate aqueous solution, and then add 3mol / L hydrochloric acid dropwise until no precipitation occurs. The precipitate is washed by centrifugatio...
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