Preparation method of large-specific-surface-area anatase TiO2 nanotubes assembled from nanosheets which are capable of exposing high-energy {111} crystal faces
A {111}, large specific surface area technology, applied in the field of low-dimensional structure semiconductor optoelectronic materials, to achieve the effect of low cost, good repeatability and consistency, and enhanced optoelectronic performance
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Embodiment 1
[0026] 0.01g TiOSO 4 ·xH 2 O (analytically pure), 5mL glacial acetic acid (analytical pure) and 5mL deionized water were added to the beaker, stirred evenly to obtain a white turbid liquid, and spread the obtained white turbid liquid to a clean area of 1×1cm 2 Then the silicon wafer was placed in a tube furnace and heated at 600°C for 10 minutes to obtain anatase TiO with large specific surface area assembled by exposing high-energy {111} crystal facet nanosheets. 2 nanotube.
[0027] Depend on Figure 1~3 It can be seen that the prepared sample is made of anatase phase TiO 2 Nanotubes assembled from nanosheets, composed of Figure 4~6 It can be seen that the sheet structure grows along the (101) and (011) directions, exposing the high-energy {111} crystal plane, which is obtained by Figure 7 It can be seen that the pore size distribution is about 30nm, and the specific surface area reaches 119m 2 / g.
Embodiment 2
[0029] 0.005g TiOSO 4 ·xH 2 O (analytically pure), 5mL glacial acetic acid (analytical pure) and 5mL deionized water were added to the beaker, stirred evenly to obtain a white turbid liquid, and spread the obtained white turbid liquid to a clean area of 1×1cm 2 Then the silicon wafer was placed in a tube furnace and heated at 600°C for 10 minutes to obtain the exposed high-energy {111} crystal facet anatase TiO 2 Nanosheets assembled into nanotubes (see Figure 8 ).
Embodiment 3
[0031] 0.1g TiOSO 4 ·xH 2 O (analytically pure), 5mL glacial acetic acid (analytical pure) and 5mL deionized water were added to the beaker, stirred evenly to obtain a white turbid liquid, and spread the obtained white turbid liquid to a clean area of 1×1cm 2 Then the silicon wafer was placed in a tube furnace and heated at 600°C for 10 minutes to obtain the exposed high-energy {111} crystal facet anatase TiO 2 Nanosheets assembled into nanotubes (see Figure 9 ).
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