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A kind of high-purity transparent dense nickel monoxide nano film preparation method

A technology of nickel monoxide and nano film, which is applied in the field of nickel monoxide film preparation, can solve the problems of poor adhesion, expensive equipment, easy introduction of impurities, etc., and achieve the effect of strong adhesion and simple method

Active Publication Date: 2020-02-07
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The spin-coating method usually needs to prepare nickel oxide precursor solution or colloidal solution first. After spin-coating, high-temperature sintering or annealing is generally required. Sometimes the preparation of the precursor is very complicated and it is easy to introduce impurities.
Physical methods such as atomic layer epitaxy, thermal evaporation, DC sputtering, and magnetron sputtering are relatively simple and difficult to introduce other impurities, but usually the equipment is expensive and requires high vacuum
Especially the film prepared by the thermal evaporation method has a low density and a porous structure, and has poor adhesion on the substrate and is easy to fall off.

Method used

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  • A kind of high-purity transparent dense nickel monoxide nano film preparation method

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Effect test

Embodiment 1

[0015] Embodiment 1: as figure 1 Shown, the preparation method of the nickel monoxide thin film of transmittance 62% at 400 nanometer wavelength place, concrete operation is as follows:

[0016] (1) In the air atmosphere of 18±4Pa, under the current condition of 8±2mA, use ion sputtering method to sputter a layer of nickel oxide film on the cleaned conductive glass (it can be any heat-resistant transparent glass) , the purity of the nickel target is 99.99%, and the sputtering time is 160 minutes;

[0017] (2) Put the nickel oxide film prepared in step (1) into a horse boiling furnace, keep the temperature at 370 degrees centigrade for 1 hour, and prepare a nickel monoxide nano film.

[0018] The surface of the film is smooth, and the surface particles are densely packed, with an average size of 420 nanometers, such as figure 1 (a) shown. The transmittance at a wavelength of 400 nm is 62%, as shown in Figure (b). figure 1 In the corresponding XRD pattern in (c), except for ...

Embodiment 2

[0019] Embodiment 2: as figure 2 Shown, the preparation method of the nickel monoxide thin film of transmittance 86% at 400 nanometer wavelength place, concrete operations are as follows:

[0020] (1) In the air atmosphere of 18±4Pa, under the current condition of 8±2mA, use ion sputtering method to sputter a layer of nickel oxide film on the cleaned conductive glass (it can be any heat-resistant transparent glass) (the purity of the nickel target is 99.99%), and the sputtering time is 24 minutes;

[0021] (2) Put the nickel oxide film prepared in step (1) into a horse boiling furnace, keep the temperature at 370 degrees centigrade for 1 hour, and prepare a nickel monoxide nano film.

[0022] The surface of the film is smooth, and the surface particles are densely packed, with an average size of 400 nanometers, such as figure 2 (a) shown. The transmittance at 400nm wavelength is 86%, such as figure 2 (b) shown.

Embodiment 3

[0023] Embodiment 3: as image 3 Shown, the preparation method of the nickel monoxide thin film of transmittance 93% at 400 nanometer wavelength place, concrete operations are as follows:

[0024] (1) In the air atmosphere of 18±4Pa, under the current condition of 8±2mA, use ion sputtering method to sputter a layer of nickel oxide film on the cleaned conductive glass (it can be any heat-resistant transparent glass) (the purity of the nickel target is 99.99%), and the sputtering time is 8 minutes;

[0025] (2) Put the nickel oxide film prepared in step (1) into a horse boiling furnace, keep the temperature at 370 degrees centigrade for 1 hour, and prepare a nickel monoxide nano film.

[0026] The surface of the film is smooth, and the surface particles are densely packed, with an average size of 380 nanometers, such as image 3 (a) shown. 93% transmittance at 400nm wavelength, such as image 3 (b) shown.

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Abstract

The invention provides a preparation method of a high-purity transparent dense nickel monoxide nano film. According to the preparation method, a nickel oxide film is sputtered to cleaned-up conductiveglass by utilizing an ion sputtering method under the conditions of air atmosphere and current; and the prepared nickel oxide film is put into a muffle furnace for constant temperature heating, so asto prepare the high-purity transparent dense nickel monoxide nano film. According to the invention, the nickel monoxide nano film is prepared by adopting an ion sputtering method, the method is simple and low in cost, complex equipment and high vacuum are not needed, and because of high energy of ion, the adhesive force of the prepared film on a substrate is strong; in the whole preparation process, except metal nickel and air, no other reaction matter is introduced, and therefore, high purity of a product is ensured; the prepared nickel monoxide film is highly transparent, and in the main energy region of solar energy, namely the whole visible region, the film can still keep high transparency; and by regulating sputtering time, the transparency of the film at the nano wavelength of 400 can be continuously regulated from 62% to 93% in a large scope.

Description

technical field [0001] The invention relates to a nickel oxide film, in particular to a method for preparing a nickel oxide film. Background technique [0002] Nickel monoxide nano-films have broad application prospects in many fields such as supercapacitors, electrochromic materials, sensors, solar cells, and photodiodes. The preparation method of the nickel monoxide nano film of existing report has hydrothermal method, homogeneous precipitation method, solution growth deposition method, electrochemical deposition method, sol-gel method, spray pyrolysis method, spin coating method, atomic layer epitaxy method, Thermal evaporation, DC sputtering, magnetron sputtering, etc. Among them, chemical methods such as hydrothermal method, homogeneous precipitation method, solution growth deposition method, electrochemical deposition method, sol-gel method, and spray pyrolysis method all involve liquid phase reactions and are easy to introduce other ions or impurities. For example, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/245
Inventor 章建辉施泽宇韩季刚
Owner NANJING UNIV