Method for preparing cadmium telluride material through electrochemical deposition
A cadmium telluride, electrochemical technology, applied in the electrolysis process, electrolysis components, etc., can solve the problems of low deposition efficiency and high comprehensive cost, and achieve the effects of high deposition efficiency, low preparation cost and short preparation cycle
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Embodiment 1
[0024] A method for preparing cadmium telluride material by electrochemical deposition, comprising the following steps:
[0025] (1) Mix and stir sodium hydroxide and ultrapure water until the solid is dissolved, then add coarse tellurium dioxide powder, heat up to 70°C, stir and react for 30min, then add cleaning agent, continue to react at 70°C, react for 1h and then cool to 40°C, filter while it is hot, and cool the filtrate to room temperature to obtain a mixed solution A; wherein, the mass ratio of sodium hydroxide, ultrapure water, and coarse tellurium dioxide powder is 1:2:1; the cleaning agent is sodium sulfide ; The amount of cleaning agent added is 3% of the mass of the coarse tellurium dioxide powder;
[0026] (2) Mix and stir cadmium chloride and ultrapure water until the solid dissolves to obtain a cadmium chloride solution; wherein, the mass ratio of the cadmium chloride and ultrapure water is 1:1; coarse tellurium dioxide powder, chlorine The mass ratio of cadm...
Embodiment 2
[0029] A method for preparing cadmium telluride material by electrochemical deposition, comprising the following steps:
[0030] (1) Mix and stir sodium hydroxide and ultrapure water until the solid is dissolved, then add coarse tellurium dioxide powder, heat up to 90°C, stir and react for 10min, then add cleaning agent, continue to react at 90°C, react for 1h and then cool to 40°C, filter while it is hot, and cool the filtrate to room temperature to obtain a mixed solution A; wherein, the mass ratio of sodium hydroxide, ultrapure water, and coarse tellurium dioxide powder is 1:6:5; the cleaning agent is thio Acetamide; the amount of cleaning agent added is 8% of the mass of the thick tellurium dioxide powder;
[0031] (2) Mix and stir cadmium chloride and ultrapure water until the solid dissolves to obtain a cadmium chloride solution; wherein, the mass ratio of the cadmium chloride and ultrapure water is 1:3; coarse tellurium dioxide powder, chlorine The mass ratio of cadmiu...
Embodiment 3
[0034] A method for preparing cadmium telluride material by electrochemical deposition, comprising the following steps:
[0035] (1) Mix and stir sodium hydroxide and ultrapure water until the solid is dissolved, then add coarse tellurium dioxide powder, heat up to 75°C, stir and react for 25min, then add cleaning agent, continue to react at 75°C, react for 1h and then cool to 40°C, filter while it is hot, and cool the filtrate to room temperature to obtain a mixed solution A; wherein, the mass ratio of sodium hydroxide, ultrapure water, and coarse tellurium dioxide powder is 1:3:2; the cleaning agent is thiocyanate ammonium acid; the amount of cleaning agent added is 4% of the mass of the coarse tellurium dioxide powder;
[0036] (2) Mix and stir cadmium chloride and ultrapure water until the solid dissolves to obtain a cadmium chloride solution; wherein, the mass ratio of the cadmium chloride and ultrapure water is 1:1.5; thick tellurium dioxide powder, chlorine The mass ra...
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