Method for preparing nano aluminum film by radio frequency magnetron sputtering
A technology of radio frequency magnetron sputtering and nano-aluminum, which is applied in the direction of sputtering plating, ion implantation plating, metal material coating technology, etc., and can solve the problems of high film porosity, high energy consumption, and the bonding ability of the film layer and the substrate Bad question
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[0015] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0016] The invention adopts magnetron sputtering technology to prepare aluminum thin film. The magnetron sputtering process is environmentally friendly, no polluting waste gas is generated, the deposition temperature is low, and the size of the substrate will not be changed. The prepared film layer is relatively dense, and the film base bonding force is good. Deposition of coatings on large area substrates.
[0017] The application principle of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0018] Such as figure 1 As shown, the method for preparing nano-aluminum fi...
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