Copper chloride corrosion solution regeneration device

Abstract

The invention discloses a regeneration device for copper chloride corrosion liquid. An etching tank is installed above a machine frame, a liquid storage tank is installed below the machine frame, andthe liquid storage tank is connected to the etching tank through a pump; and the etching tank is connected with a liquid inlet of a detection station through a pipeline, a liquid outlet of the detection station is connected with the liquid storage tank through a pipeline, the detection station is in communication connection with a control module, and the control module is in communication connection with a pump control system to control the operation state of the pump. According to the regeneration device, the specific gravity, the acidity value, redox capacity and temperature of the etching liquid are controlled through full automation, so that hydrochloric acid and sodium chlorate liquid serving as an oxidizing agent are automatically and effectively supplemented, a corrosive liquid regeneration reaction is carried out, and therefore the effect of circularly reusing the etching liquid is achieved; the optimal etching liquid concentration is controlled through an oxidizing agent sensor, the minimum oxidizing agent is used for supplementing insufficient parts of the etching solution regenerated by oxygen, meanwhile, the stable etching rate is maintained, labor intensity of operators is reduced, product quality is improved, emission is reduced, and production cost is saved; and practice proves that production cost can be saved by 70%.

Description

technical field [0001] The invention relates to a device for regenerating copper chloride corrosion liquid. Background technique [0002] In the photoengraving process of the plate making industry, it is necessary to produce intaglio through plate etching. The traditional plate etching process generally uses ferric chloride etching solution to etch the pattern of copper rollers. Every time a copper roller is corroded, part of the ferric chloride solution will be discharged correspondingly, resulting in The liquid level in the etching tank drops; the Baume degree of the ferric chloride corrosion solution is generally measured manually at regular intervals. When it is lower than the standard value, the waste liquid is manually drained from the liquid tank, and then the same amount of raw liquid is manually replenished. The cost of waste liquid discharge and treatment is high. Pollution to the environment, large consumption of stock solution, waste of energy, and high cost inve...

AI Technical Summary

Problems solved by technology

[0002] In the photoengraving process of the plate making industry, it is necessary to produce intaglio through plate etching. The traditional plate etching process generally uses ferric chloride etching solution to etch the pattern of copper rollers. Every time a copper roller is corroded, part of the ferric chloride solution will be discharged correspondingly, resulting in The liquid level in the etching tank drops; the Baume degree of the ferric chloride corrosion solution is generally measured manually at regular intervals. When it is lower than the standard value, the waste liquid is manually drained from the liquid tank, and then the same amount of raw liquid is manually replenished. The cost of waste liquid discharge and treatment is high. Pollution to the environment, large consumption of stock solution, waste of energy, and high cost investment; multiple manual inspections are required during the etching process of each copper roller, and the layout needs to be washed with water during the manual inspection process, and the cleaning water will enter the corrosion solution tank, reducing The effective specific gravity of the bath affects the etching rate, poor stability, high consumption of raw materials, high labor intensity of operators, and increased production and operation costs

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