Amorphous alloy reflection mirror and preparing method thereof
A technology of amorphous alloy and reflective mirror, which is applied in the field of amorphous alloy reflective mirror and its preparation, can solve the problems of low hardness, high price of silver reflective layer, weak anti-oxidation, vulcanization ability and corrosion resistance, and achieve hardness High, low manufacturing cost, high reflectivity effect
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Embodiment 1
[0012] Use acetone, alcohol, and pure water to ultrasonically clean the glass substrate, and use a Ti target with a diameter of 60mm to perform DC magnetron sputtering coating on the glass substrate to obtain a transition layer, and then use Zr-Cu-Ni-Al-Ag-Y amorphous alloy The target (the atomic percentage of which: 58%Zr, 27%Cu, 3%Ni, 11.85%Al, 0.05%Ag, 0.1%Y) is coated on the transition layer by DC magnetron sputtering to obtain an amorphous reflective coating, The sputtering power is 80W, the argon pressure is 0.6Pa, the substrate temperature is room temperature, and the thicknesses of the transition layer and the amorphous layer are about 10nm and 400nm respectively. The hardness of the reflective mirror is 12GPa, the reflectivity is 0.86, the number of scratch resistance is 30 times, and the salt spray test (salt spray concentration is 5%, temperature is 35°C, humidity is 60%) is greater than 500h.
Embodiment 2
[0014] Use acetone, alcohol and pure water to ultrasonically clean the stainless steel substrate, and use a Ni target with a diameter of 60mm to conduct DC magnetron sputtering coating on the stainless steel substrate to obtain a transition layer, and then use Zr-Cu-Ni-Al-Ag-Er amorphous alloy The target (the atomic percentage of which: 58%Zr, 27%Cu, 3%Ni, 11.85%Al, 0.05%Ag, 0.1%Er) is coated on the transition layer by DC magnetron sputtering to obtain an amorphous reflective coating, The sputtering power is 80W, the argon pressure is 0.6Pa, the substrate temperature is room temperature, and the thicknesses of the transition layer and the amorphous layer are about 20nm and 1000nm respectively. The hardness of the mirror is 14GPa, the reflectivity is 0.89, the number of scratch resistance is 82 times, and the salt spray test is more than 800h.
Embodiment 3
[0016] Use acetone, alcohol, and pure water to ultrasonically clean and polish the alumina substrate, and use a Cr target with a diameter of 60mm to perform DC magnetron sputtering coating on the alumina substrate to obtain a transition layer, and then use Zr-Cu-Ni-Al-Ag-Sc Amorphous alloy target (atomic percentage: 58%Zr, 27%Cu, 3%Ni, 11.85%Al, 0.05%Ag, 0.1%Sc) is coated on the transition layer by DC magnetron sputtering to obtain amorphous reflection For the coating, the sputtering power is 80W, the argon pressure is 0.6Pa, the substrate temperature is room temperature, and the thicknesses of the transition layer and the amorphous layer are about 28nm and 5000nm respectively. The hardness of the mirror is 15GPa, the reflectivity is 0.91, the number of scratch resistance is 160 times, and the salt spray test is greater than 1200h.
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Abstract
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