Metal cavity-comprising three-dimensional ceramic substrate and preparation method thereof
A ceramic substrate and metal cavity technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of long process time, poor heat resistance and aging resistance, poor screen printing graphic accuracy, etc., and achieve material cost Low temperature, good heat resistance, and simple process
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Embodiment 1
[0052] Figure 10 It is a schematic diagram of a three-dimensional ceramic substrate containing a metal cavity in Example 1. Such as Figure 10 As shown, Embodiment 1 provides a three-dimensional ceramic substrate containing a metal cavity, including a planar ceramic substrate 101 and a metallic copper cavity structure 105 . Wherein, the planar ceramic substrate is made up of ceramic substrate 102, independent circuit 103 and metal through-hole 104; mm).
[0053] Figure 9 For the preparation flow chart of the three-dimensional ceramic substrate containing the metal cavity of the embodiment of the present invention, such as Figure 9 As shown, the specific preparation process includes:
[0054] (1) The planar ceramic substrate (including electroplating seed layer) is prepared by DPC process, and the surface is arranged with independent lines and circular copper plating layer (according to the metal cavity structure design, the circular copper plating layer has an outer di...
Embodiment 2
[0063] Figure 12 It is a schematic diagram of a three-dimensional ceramic substrate containing a metal cavity in Example 2, such as Figure 12 As shown, the structure of the three-dimensional ceramic substrate is similar to Embodiment 1, the difference is that the DPC ceramic substrate has no metal through holes, such as Figure 12 shown. The structure of the annular copper plating layer on the surface is a square ring (the side length is 5mm, the ring width is 1mm, and the thickness is 50um, the material of the metal hole plate is metal aluminum, and the through holes on the corresponding metal aluminum plate and transparent plastic plate are square holes, and the side length 5mm), the obtained three-dimensional ceramic substrate containing square metal cavities is as follows Figure 13 shown.
Embodiment 3
[0065] The structure of this three-dimensional ceramic substrate is similar to embodiment 2, and the difference is that the annular copper layer structure on the surface of the DPC ceramic substrate is a rectangle (20mm long, 10mm wide, 2mm wide, and 30um thick), and the corresponding metal orifice plate and plastic orifice plate The structure and size of the through holes are also adjusted to elongated holes.
[0066] The preparation method of the three-dimensional ceramic substrate containing the metal cavity of the present invention uses an electroplating process to realize the direct bonding between the metal hole plate and the annular copper plating layer of the planar ceramic substrate (electroplating fills the gap between the two), and prepares the three-dimensional ceramic containing the metal cavity substrate. In addition, by processing metal orifice plates with different structures (shape, size, and thickness), three-dimensional ceramic substrates with different cavi...
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Abstract
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