Preparation method of conductive powder with antimony-doped zinc oxide and stannic oxide coating monox
A technology for coating silicon oxide and zinc oxide, which is applied in oxide conductors, cable/conductor manufacturing, circuits, etc., can solve the problems of high price, high energy consumption in the preparation process, and high heat treatment temperature, and achieves the improvement of powder whiteness, application Broad, high whiteness effect
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Embodiment 1
[0024] (1) Put 100 grams of pure quartz powder into a beaker filled with distilled water adjusted to a pH of 2.0 to 3.0 with hydrochloric acid, keep the content of silicon oxide in distilled water at 0.5g / ml, and place the beaker in a constant temperature water bath at 80°C Stir in;
[0025] (2) ZnCl 2 , SnCl 4 Dissolve in hydrochloric acid at a mass ratio of 1:3 to make a solution with a concentration of 0.6mol / L, and add SbCl at the same time 3 , forming Zn 2+ and Sn 4+ Mixture of Sb with 3+ The mol ratio is the mixed solution of 1:0.03;
[0026] (3) Prepare the Zn-containing 2+ , Sn 4+ and Sb 3+ The hydrochloric acid mixed solution and an appropriate amount of sodium hydroxide solution are respectively dripped into the suspension of silicon oxide through the control of the peristaltic pump. The dripping rate of the mixed solution is 0.5ml / min. Adjust the dripping rate of the sodium hydroxide solution so that the The PH value is kept at 2.0-3.0;
[0027] (4) Select...
Embodiment 2
[0031] (1) Put 100 grams of pure quartz powder into a beaker filled with distilled water adjusted to a pH of 2.0 to 3.0 with hydrochloric acid, keep the content of silicon oxide in distilled water at 0.5g / ml, and place the beaker in a constant temperature water bath at 80°C Stir in;
[0032] (2) ZnCl 2 , SnCl 4 Dissolve in hydrochloric acid at a mass ratio of 1:3 to make a solution with a concentration of 0.8mol / L, and add SbCl at the same time 3 , forming Zn 2+ and Sn 4+ Mixture of Sb with 3+ The mol ratio is the mixed solution of 1:0.03;
[0033] (3) Prepare the Zn-containing 2+ , Sn 4+ and Sb 3+ hydrochloric acid solution and an appropriate amount of potassium hydroxide solution are respectively dripped into the suspension of silicon oxide under the control of a peristaltic pump, and the dripping rate of the mixed solution is 0.5ml / min. The pH value is kept at 2.0-3.0;
[0034] (4) Selecting the addition of the mixed solution is 30% of the mass of silicon oxide to...
Embodiment 3
[0038] (1) Put 100 grams of pure quartz powder into a beaker filled with distilled water adjusted to a pH of 2.0 to 3.0 with hydrochloric acid, keep the content of silicon oxide in distilled water at 0.5g / ml, and place the beaker in a constant temperature water bath at 80°C Stir in;
[0039] (2) ZnCl 2 , SnCl 4 Dissolve in hydrochloric acid at a mass ratio of 1:4 to make a solution with a concentration of 0.7mol / L, and add SbCl at the same time 3 , forming Zn 2+ and Sn 4+ Mixture of Sb with 3+ The mol ratio is a mixed solution of 1:0.04;
[0040] (3) Prepare the Zn-containing 2+ , Sn 4+ and Sb 3+ hydrochloric acid solution and an appropriate amount of sodium hydroxide solution are respectively dripped into the suspension of silicon oxide under the control of a peristaltic pump, and the dripping rate of the mixed solution is 0.5ml / min. The pH value is kept at 2.0-3.0;
[0041] (4) Selecting the added amount of the mixed solution is 50% of the mass of silicon oxide to ...
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