Acidic texture surface making additive used for surface treatment of diamond wire sawn polycrystalline silicon wafer, and use method of the additive

Abstract

The invention discloses an acidic texture surface making additive used for surface treatment of a diamond wire sawn polycrystalline silicon wafer, which includes, by weight, 0.5-5% of oxalic acid, 1-10% of N-methylpyrrolidone, 0.1-3% of a nitrogen-containing polymer and the balanced being water. The invention also discloses an acidic texture surface making agent used for surface treatment of the diamond wire sawn polycrystalline silicon wafer, which includes the acidic texture surface making additive and an acid solution being a deionized water solution of hydrofluoric acid and nitric acid, wherein the weight percentage of the hydrofluoric acid is 5-10% and the weight percentage of the nitric acid is 20-60%. The invention also includes a method for surface treatment of the diamond wire sawn polycrystalline silicon wafer. The additive is toxic-free and non-irritation, has no corrosion, is reduced in usage amount of inorganic acid, and can reduce environment load. The diamond wire sawn polycrystalline silicon wafer treated by the additive and through the use method has good uniformity, has fine and uniform texture size and is low in reflectivity.

Description

technical field [0001] The invention relates to an acidic texturing additive used for surface treatment of polycrystalline diamond wire-cut silicon wafers, a method for using the additive, and a method for using the additive to texture polycrystalline diamond wire-cut silicon wafers. Background technique [0002] During the preparation of polycrystalline silicon solar cells, it is necessary to make texture on the surface of polycrystalline diamond wire cut silicon wafers. The resulting textured structure can make incident sunlight reflect and refract multiple times on the surface of silicon wafers, increasing the absorption of solar energy by silicon wafers. At the same time, more carriers are generated and enriched in the area near the PN junction to improve the performance and efficiency of the solar cell. It can be seen that the surface texture treatment of polycrystalline diamond wire cut silicon wafers is a key factor affecting the performance of polycrystalline silicon...

AI Technical Summary

Problems solved by technology

At present, the deionized acidic solution of nitric acid and hydrofluoric acid is commonly used in industrial production to make texture, but the texture effect of this kind of acid texture solution is not ideal, the size of the texture is large and the uniformity is poor, the reflectivity of the silicon wafer surface is high, and the texture is stable. Poor performance, heavy stains on the surface of silicon wafers, etc.