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Local electromagnetic field enhancement device for Raman spectrum characterization as well as preparation method, application and utilization method thereof

A technology of Raman spectroscopy and electromagnetic field, applied in the field of detection, can solve the problems that it is difficult to obtain the difference of single-molecule configuration and conformation, and it is difficult to obtain Raman scattering signals on the single-molecule scale, so as to overcome the difference of configuration and conformation, Effect of enhancing Raman scattering signal and preventing oxidation of silver layer

Inactive Publication Date: 2018-06-29
CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Due to the limitations of surface-enhanced Raman scattering spectroscopy in terms of spatial resolution and local electromagnetic enhancement performance, it is difficult to obtain Raman scattering signals at the single-molecule scale. Therefore, the needle tip combined with nanostructure local enhancement technology Raman-enhanced technology has begun to be used for the characterization and analysis of molecular-scale materials and biological environmental samples, but it is still difficult to obtain the differences between single-molecule configurations and their isomers

Method used

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  • Local electromagnetic field enhancement device for Raman spectrum characterization as well as preparation method, application and utilization method thereof
  • Local electromagnetic field enhancement device for Raman spectrum characterization as well as preparation method, application and utilization method thereof
  • Local electromagnetic field enhancement device for Raman spectrum characterization as well as preparation method, application and utilization method thereof

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Effect test

Embodiment 1

[0033] Fabrication of Localized Electromagnetic Field Enhanced Devices for Raman Spectroscopy Characterization

[0034] (1) Preparation of composite metal nanohole array substrate

[0035] see figure 1 The flow chart of the preparation process of the composite metal nanohole array substrate. After the glass sheet 1 is cleaned by a plasma cleaning machine, a 2nm thick chromium layer 2 and a 100nm thick gold layer 3 are sequentially deposited from bottom to top using vacuum evaporation technology and a silver layer 4 with a thickness of 20nm, and then use the focused ion beam etching technique (etching principle see figure 2 ), using a gallium source, using a 15μm aperture, when the beam current is less than 5pA, the focused ion beam dose is 0.1nC / μm 2 Under the above conditions, the silver layer 4 is first etched, and the silver atoms sputtered during the etching process are re-deposited on the unetched place of the silver layer 4. After the silver layer 4 is etched through,...

Embodiment 2

[0039] Fabrication of Localized Electromagnetic Field Enhanced Devices for Raman Spectroscopy Characterization

[0040] (1) Preparation of composite metal nanohole array substrate

[0041] see figure 1 Process flow chart for the preparation of the composite metal nanohole array substrate. After cleaning the glass sheet 1 with a plasma cleaner, a 3nm-thick chromium layer 2 and a 50nm-thick gold layer 3 are sequentially deposited from bottom to top using vacuum evaporation technology. and a silver layer 4 with a thickness of 35nm, and then use the focused ion beam etching technique (etching principle see figure 2 ), using a gallium source, using a 15μm aperture, when the beam current is less than 5pA, the focused ion beam dose is 0.05nC / μm 2 Under the above conditions, the silver layer 4 is first etched, and the silver atoms sputtered during the etching process are re-deposited on the unetched place of the silver layer 4. After the silver layer 4 is etched through, the gold l...

Embodiment 3

[0045] Fabrication of Localized Electromagnetic Field Enhanced Devices for Raman Spectroscopy Characterization

[0046] (1) Preparation of composite metal nanohole array substrate

[0047] see figure 1 The flow chart of the preparation process of the composite metal nanohole array substrate. After the glass sheet 1 is cleaned by a plasma cleaning machine, a 2nm thick chromium layer 2 and a 75nm thick gold layer 3 are sequentially deposited from bottom to top using vacuum evaporation technology. and a silver layer 4 with a thickness of 50nm, and then use focused ion beam etching (etching principle see figure 2 ), using gallium source, 15μm aperture, when the beam current is less than 5pA, the focused ion beam dose is 0.02nC / μm 2 Under the above conditions, the silver layer 4 is first etched, and the silver atoms sputtered during the etching process are re-deposited on the unetched place of the silver layer 4. After the silver layer 4 is etched through, the gold layer 3 is et...

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Abstract

The invention relates to a local electromagnetic field enhancement device for Raman spectrum characterization as well as a preparation method, application and a utilization method thereof and belongsto the technical field of detection. The device comprises a composite metal nano-pore array substrate and an atomic force microscope probe, wherein the composite metal nano-pore array substrate is sequentially composed of a hard substrate, a chrome layer, a gold layer and a silver layer with the upper surface coated with a gold film from bottom to top; nano-pore arrays are arranged on the silver layer and the gold layer; the vertical depth of nano-pores is less than the sum of the thicknesses of the silver layer and the gold layer; pore walls of the nano-pores are coated with gold films; the surface of the atomic force microscope probe is coated with a silver film; the surface of a probe tip of the probe is provided with stripes. By adopting the device provided by the invention, single-molecule-grade molecular fingerprint spectrum characterization analysis can be realized, so that the disadvantage that configuration and conformation difference of a real single molecule on the surface of the substrate cannot be obtained by common Raman or surface enhanced scattering Raman is overcome; the local electromagnetic field enhancement device also can be applied to characterization of configuration and conformation of isomer molecules and discriminatory analysis of isomers in a single molecule level is realized.

Description

technical field [0001] The invention belongs to the technical field of detection, and in particular relates to a local electromagnetic field enhancement device for Raman spectrum characterization and its preparation method, application and use method. Background technique [0002] Surface-enhanced Raman scattering spectroscopy technology can greatly enhance the Raman scattering signal of trace molecules by virtue of the enhancement effect of the electromagnetic field on the surface of the substrate material, and the configuration and conformation of molecules can be obtained through the difference in characteristic peak position, intensity or line width information It has unique advantages in the rapid analysis of trace environmental pollutants and their different isomers, especially in the analysis of isomer molecules with different toxicity. important role. Due to the limitations of surface-enhanced Raman scattering spectroscopy in terms of spatial resolution and local el...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65G01Q80/00
CPCG01N21/658G01Q80/00
Inventor 何石轩王德强谢婉谊方绍熙周硕周大明唐鹏梁丽媛石彪王赟姣殷博华
Owner CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI
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