Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for manufacturing magnesium oxide and zinc oxide target billet

A manufacturing method and magnesium oxide technology, which is applied in the field of target sputtering, can solve the problems that the performance of the magnesium oxide zinc oxide target blank needs to be improved, and achieve the effects of improving density, microstructure uniformity, uniform color, and improving performance

Inactive Publication Date: 2018-07-06
KONFOONG MATERIALS INTERNATIONAL CO LTD
View PDF3 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the performance of the magnesium oxide zinc oxide target blank formed by the prior art needs to be improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing magnesium oxide and zinc oxide target billet
  • Method for manufacturing magnesium oxide and zinc oxide target billet
  • Method for manufacturing magnesium oxide and zinc oxide target billet

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] It can be seen from the background technology that the performance of the magnesium oxide zinc oxide target blank formed in the prior art needs to be improved. Analyze the reasons for this:

[0041]The manufacturing process of magnesium oxide zinc oxide target blank is mainly sintering at normal pressure or cold pressing after mixing. Therefore, the formed magnesium oxide zinc oxide target blank has low density, poor processability, microstructure uniformity and surface uniformity, and is prone to cracks, which makes it difficult for the formed magnesium oxide zinc oxide target blank to reach semiconductor, Solar energy, LCD and other industries use requirements. Therefore, there is an urgent need to provide a sintering process for the magnesium oxide zinc oxide target blank to ensure that the formed magnesium oxide zinc oxide target blank can meet the performance requirements of the sputtering target.

[0042] In order to solve the above problems, the present inventi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for manufacturing a magnesium oxide and zinc oxide target billet. The method comprises the following steps: providing zinc oxide and magnesium oxide mixed powder; adding the zinc oxide and magnesium oxide mixed powder into a die, and performing a hot-pressing sintering technology on the zinc oxide and magnesium oxide mixed powder to form a magnesium oxide and zinc oxide alloy; and taking out the magnesium oxide and zinc oxide alloy from the die to obtain the magnesium oxide and zinc oxide target billet. Compared with a normal-pressure sintering or cold-pressingmolding technology, the method in the invention can improve the density and the microhomogeneity of the formed magnesium oxide and zinc oxide target billet and reduce the probability of cracks in themagnesium oxide and zinc oxide target billet to make the density of the magnesium oxide and zinc oxide target billet reach 98% or more and the magnesium oxide and zinc oxide target billet have a uniform color, so the performances of the formed magnesium oxide and zinc oxide target billet are improved, and the magnesium oxide and zinc oxide target billet has stable physical properties and can meetperformance requirements of a sputtering target.

Description

technical field [0001] The invention relates to the field of target material sputtering, in particular to a method for manufacturing a magnesium oxide zinc oxide target blank. Background technique [0002] Sputtering technology is one of the commonly used processes in the field of target sputtering. With the increasing development of sputtering technology, sputtering targets play an increasingly important role in sputtering technology. The sputtering target is mainly composed of a target blank and a back plate, and the quality of the target blank directly affects the film-forming quality of the sputtering target. [0003] Zinc oxide (ZnO) is a direct bandgap wide bandgap (3.37eV) II-VI compound semiconductor material with a large exciton binding energy (60meV), and zinc oxide is also a high-quality piezoelectric, gas-sensitive and Optoelectronic materials. Since zinc oxide has many advantages in structure, energy band, electricity and optics, and there are many methods for...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C04B35/453C04B35/626C23C14/34
CPCC23C14/3414C04B35/453C04B35/62605C04B2235/3206
Inventor 姚力军潘杰相原俊夫王学泽王钜宝
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products