Method for manufacturing magnesium oxide and zinc oxide target billet
A manufacturing method and magnesium oxide technology, which is applied in the field of target sputtering, can solve the problems that the performance of the magnesium oxide zinc oxide target blank needs to be improved, and achieve the effects of improving density, microstructure uniformity, uniform color, and improving performance
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[0040] It can be seen from the background technology that the performance of the magnesium oxide zinc oxide target blank formed in the prior art needs to be improved. Analyze the reasons for this:
[0041]The manufacturing process of magnesium oxide zinc oxide target blank is mainly sintering at normal pressure or cold pressing after mixing. Therefore, the formed magnesium oxide zinc oxide target blank has low density, poor processability, microstructure uniformity and surface uniformity, and is prone to cracks, which makes it difficult for the formed magnesium oxide zinc oxide target blank to reach semiconductor, Solar energy, LCD and other industries use requirements. Therefore, there is an urgent need to provide a sintering process for the magnesium oxide zinc oxide target blank to ensure that the formed magnesium oxide zinc oxide target blank can meet the performance requirements of the sputtering target.
[0042] In order to solve the above problems, the present inventi...
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