Ultraviolet-cured thin film with adjustable refractive index and preparation method of ultraviolet-cured thin film

A refractive index and ultraviolet technology, applied in the field of optical materials, can solve the problems of structural collapse and cannot meet the high-energy transmission requirements of strong laser devices, and achieve the effect of high resistance to laser damage and excellent resistance to laser damage.

Active Publication Date: 2018-08-21
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

SiO prepared by PVD method 2 Although the anti-reflection coating system can realize the adjustment of the refractive index, it cannot meet the high-energy transmission requirements in

Method used

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  • Ultraviolet-cured thin film with adjustable refractive index and preparation method of ultraviolet-cured thin film
  • Ultraviolet-cured thin film with adjustable refractive index and preparation method of ultraviolet-cured thin film

Examples

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Effect test

Embodiment 1

[0025] A kind of ultraviolet curing film with adjustable refractive index, its preparation method comprises the following steps:

[0026] (1) Mix ethyl orthosilicate, deionized water, and ethanol in a molar ratio of 1:3:10, and then follow the principle of silane hydrolysis and polycondensation to react at 10°C for 18 hours to obtain oligomers, and continue at 50°C Under aging for 60h, SiO was prepared by self-assembled clusters of oligomers 2 porous ball;

[0027] (2) Mix silane methacrylate, deionized water, and ethanol at a molar ratio of 1:5:10, and then follow the principle of silane hydrolysis and polycondensation to react at 120°C for 7 hours to obtain oligomers. 4% photoinitiator TPO by mass and stir evenly to obtain UV-curable sol;

[0028] (3) Combine UV-curable sol and SiO 2 The porous balls are mixed evenly according to the mass ratio of 1:10, and then coated on the fused silica substrate by the spin coating method, and the film to be cured is prepared by using ...

Embodiment 2

[0032] A kind of ultraviolet curing film with adjustable refractive index, its preparation method comprises the following steps:

[0033] (1) Mix ethyl orthosilicate, deionized water, and acetone at a molar ratio of 0.8:2.5:8, and then follow the principle of silane hydrolysis and polycondensation to react at 8°C for 24 hours to obtain oligomers, and continue at 45°C Under aging for 72h, SiO was prepared by self-assembled clusters of oligomers 2 porous ball;

[0034] (2) Mix silane methacrylate, deionized water, and acetone at a molar ratio of 0.8:4:8, and then follow the principle of silane hydrolysis and polycondensation to react at 110°C for 8 hours to obtain oligomers. 5% photoinitiator TPO by mass and stir evenly to obtain UV curable sol;

[0035] (3) Combine UV-curable sol and SiO 2 The porous balls are mixed evenly according to the mass ratio of 1:20, and then coated on the fused silica substrate by the spin coating method, and the film to be cured is prepared by usi...

Embodiment 3

[0039] A kind of ultraviolet curing film with adjustable refractive index, its preparation method comprises the following steps:

[0040] (1) Mix ethyl orthosilicate, deionized water, and decane in a molar ratio of 1.2:3.5:12, and then follow the principle of silane hydrolysis and polycondensation to react for 12 hours at 12°C to obtain oligomers, and continue at 55°C SiO was prepared by oligomer self-assembled clusters after aging for 48 h under the same conditions 2 porous ball;

[0041] (2) Mix silane methacrylate, deionized water, and decane at a molar ratio of 1.2:6:12, then follow the principle of silane hydrolysis and polycondensation reaction at 130°C for 6 hours to obtain oligomers, and add Zhan to the reaction system The total mass of 3% photoinitiator TPO is stirred evenly to obtain a UV-curable sol;

[0042] (3) Combine UV-curable sol and SiO 2 The porous balls are mixed evenly according to the mass ratio of 1:30, and then coated on the fused silica substrate by...

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Abstract

The invention provides an ultraviolet-cured thin film with an adjustable refractive index and a preparation method of the ultraviolet-cured thin film. The preparation method comprises steps as follows: ethyl orthosilicate, deionized water and an organic solvent are mixed and subjected to a reaction for 12-24 h at 8-12 DEG C, an oligomer is prepared and then is aged for 48-72 h at 45-55 DEG C, andSiO2 porous spheres are prepared by self-assembly clustering of the oligomer; (2), silane methacrylate, deionized water and the organic solvent are mixed and subjected to a reaction for 6-8 h at 110-130 DEG C, an oligomer is prepared, a photoinitiator is added, and UV-curable sol is prepared; (3), the SiO2 porous spheres and the UV-curable sol are mixed, and a to-be-cured thin film is prepared; (4), the to-be-cured thin film is irradiated under ultraviolet light, and the ultraviolet-cured thin film with the adjustable refractive index is prepared. The prepared thin film has wider refractive index regulating range and high resistance to laser damage, and high-energy laser output of an intense laser device can be realized.

Description

technical field [0001] The invention belongs to the technical field of optical materials, and in particular relates to an ultraviolet curing film with adjustable refractive index and a preparation method thereof. Background technique [0002] The tunable refractive index film can achieve ultra-high transmittance (higher than 99.5%) for electromagnetic waves of different wavelengths, and has a huge application demand in the fields of strong laser devices and solar cells. The method of ultraviolet curing can quickly realize the preparation of the film, which greatly improves the preparation efficiency. [0003] SiO 2 Anti-reflection coating system is a widely used optical material with good optical properties, mechanical properties and chemical stability. SiO prepared by PVD method 2 Although the anti-reflection coating system can realize the adjustment of the refractive index, it cannot meet the high-energy transmission requirements in strong laser devices; and the prepara...

Claims

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Application Information

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IPC IPC(8): C08J5/18C09D4/02C09D7/61
CPCC08J5/18C08K7/26C09D4/00C09D7/70
Inventor 邓雪然雷向阳杨伟张清华惠浩浩马红菊张剑锋王梓龙张帅苏文虎张利平王健许乔
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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