53results about How to "Adjustable refractive index" patented technology

The invention discloses an adjustable-refractivity silicon dioxide coated quantum dot nano composite luminescent material which is composed of SiO2 nanoparticles, wherein each SiO2 particle is a nano composite particle formed by coating SiO2 on a single quantum dot or a nano composite particle formed by coating SiO2 on multiple evenly-dispersed quantum dots. The invention also discloses a method for preparing the nano composite particles (each of which is formed by coating SiO2 on a single quantum dot or coating SiO2 on multiple quantum dots) by inverse microemulsion polymerization reaction. In practical use, the technological parameters, such as consumptions of TEOS (tetraethyl orthosilicate), surfactant, catalyst and quantum dots, reaction time and the like, can be adjusted to adjust the thickness of the SiO2 shell and the proportion of the quantum dot core in the SiO2 coated quantum dot nano composite particles, thereby adjusting the refractivity of the SiO2 coated quantum dot nano composite material. The refractivity of the nano composite luminescent material is adjustable within the range of 1.42-1.98.

The invention provides a fluorine-containing polyimide optical waveguide material and the preparing method thereof relating to the integrating polymer material preparing method in optical device, which can be applied in waveguide optics device, the material is obtained from condensation and copolymerization of three monomers, that is the fluorine-containing polyimide is condensed and copolymerized from two diamine monomers and one dianlydride monomer or from two diamine monomers and one dianlydride monomer, after purification, the fluorine-containing polyimide n-methyl-2-pyrrolidone solution is obtained, and is then dropped on center of clean substrate for spin coating to form film, and desiccation and curing. The glass transition temperature of the material is above 200 DEG C, in the field of optical communication on 1550nm the optical loss is less than 0.6dB/cm, the refractive index on 1550nm is 1.5-1.6.

The invention relates to a preparation method for fluorine-containing low-refractivity Yb<3+>-doped quartz glass. The method comprises the steps: starting from a solution, preparing evenly doped silicon oxide powder by using a sol-gel method; and carrying out decarbonization and dehydroxylation treatment on the powder, and finally sintering into glass. By applying the method, F<-> can be effectively introduced, and the rare earth-doped quartz glass with high uniformity, low hydroxyl content and the refractivity almost identical to that of the pure quartz glass can be obtained. The method can be applied to preparation of a high-brightness large-mode-field quartz optical fiber mandril.

The invention discloses soluble and high-temperature resistant aromatic polyimide and a preparation method thereof. The preparation method comprises the following steps: stirring a 2,2'-R,R-4,4'-diaminodiphenyl compound and a 2,2'-R,R-4,4',5,5'-diphenyltetracarboxylic dianhydride compound in molar ratio of 1 to 1 in a strongly polar non-proton organic solvent at the room temperature to obtain homogeneous-phase, transparent and viscous polyimide solution; and dehydrating the polyimide solution to obtain the soluble and high-temperature resistant aromatic polyimide. The soluble and high-temperature resistant aromatic polyimide has the polyimide of the repetitive unit of a general formula [1] that number average molecular weight Mn is equal to 8,000 to 20,000; molecular weight distribution Mw/Mn is equal to 1.2 to 1.7; and R is a group in the 2,2'-R,R-4,4'-diaminodiphenyl compound, and R' is a group in the 2,2'-R,R-4,4',5,5'-diphenyltetracarboxylic dianhydride compound. The aromatic polyimide is soluble in the high-temperature or chemical dehydration full ring closure of weakly polar solvents.

The invention discloses a preparation method for phenyl hydrogen-containing silicone oil, which comprises the steps as follows: firstly, phenyl alkoxyl silane and cyclosiloxane are used as basic reaction monomers; moreover, organic solvent, water and blocking agent are added to implement hydrolysis condensation reaction under the effect of acidic catalyst; secondarily, after the hydrolysis condensation reaction is completed, the reaction liquid obtained is washed to neutral and then low-boiling substances in the reaction liquid are removed, thus obtaining the phenyl hydrogen-containing silicone oil. The preparation method for phenyl hydrogen-containing silicone oil has the advantages of easily obtained material, simple operation, easy control, no pollution, gentle condition and convenientindustrialization. The number-average molar mass of the phenyl hydrogen-containing silicone oil prepared is between 0.5*103 and 5.0*103, the refractive index is adjustable between 1.41 and 1.60 and the hydrogen content is adjustable between 0.2 and 1.2wt percent. The phenyl hydrogen-containing silicone oil has excellent performances of high refractive index, high light transmittance, radiation resistance, high and low temperature resistance, weather resistance, etc. The phenyl hydrogen-containing silicone oil is suitable to be used as cosmetic additives, lubricant additives, cross-linking agent of electronic pouring sealant and cross-linking agent used for seal rings.

The invention provides a manufacturing method of a P-type single crystal PERC battery capable of improving a LeTID phenomenon. The manufacturing method comprises the following steps of S1, surface texturing, S2, high-temperature phosphorus diffusion, S3, etching the periphery and polishing the back surface, S4, preparing a front silicon dioxide layer and a back silicon dioxide layer, S5, preparinga back aluminum oxide layer, S6, preparing a back silicon carbonitride layer, S7, preparing a back silicon oxynitride laminated layer, S8, preparing a front silicon oxynitride layer, S9, conducting laser grooving on the back face, and S10, preparing a front electrode and a back electrode. The hydrogen source is reduced by changing the structure of the battery film layer, the manufacturing raw materials and the corresponding process optimization method, redundant hydrogen atoms in the solar battery piece are reduced, and the technical effect of improving the LeTID phenomenon of the solar battery is achieved.

The present invention provides a cesium-rubidium-borate nonlinear optical crystal, which is represented by the chemical formula Cs_xRb_1-xB₃O₅ (0<x<1), and belongs to the P2₁2₁2₁ space group with the unit cell parameters in the following range: a=8.202-8.514 Å, b=10.075-9.140 Å, c=5.375-6.207 Å and Z=4. A preparation method of the crystal is as follows: a cesium salt, a rubidium salt and a boron-containing compound are mixed pro rata, heated, kept at a temperature, and then cooled down to obtain the cesium-rubidium-borate. The cesium-rubidium-borate and a flux are mixed and heated to form a melt to obtain a mixing melt. Then a seed crystal attached to a seed rod is dipped into the mixing melt and the seed rod is rotated simultaneously. The melt is kept at 620-780° C., and then cooled down slowly at a rate of 0-5° C. per day. The obtained crystal is drawn out of the melt surface and cooled down to room temperature. Thereby, the cesium-rubidium-borate nonlinear optical crystal is obtained. The crystal can be used for laser light wavelength conversion, optical parametric amplification, electrooptic modulation, optical waveguide and etc.

The invention relates to hybrid organic silicon resin with a framework structure containing Zr or containing Zr and Ti simultaneously and a preparation method of the organic silicon resin. The structure of the resin contains Si-O-Si, Si-O-Zr and Zr-O-Zr structural units, or is likely to contain Si-O-Ti, Ti-O-Ti and Ti-O-Zr structural units simultaneously. According to the preparation method of the resin, the hydrolytic condensation process of organic Zr or combined hydrolytic condensation of organic Zr and titanate is realized in an organic silicon resin solution with the low molecular weight, and the resin is prepared. The synthetic method is simple and easy to implement, and industrial production is facilitated. Zr is introduced, or Ti links are introduced simultaneously, so that the refraction index and the high-temperature resistance of the hybrid resin can be significantly improved. The organic silicon resin with the low molecular weight in raw materials is converted, and olefinic bonds or -Si-H active groups are easily introduced into the hybrid resin structure, so that the hybrid organic silicon resin can have the addition curing reaction.

The invention relates to the technical field of a resin and a preparation method thereof, particularly a photocuring resin containing polyethoxy bisthiophenyl fluorene structure and a preparation method thereof. The preparation method comprises the following steps: adding 9.9-(4-thiophenyl-hydroxypolyethoxy)bis fluorene and (methyl)acrylic acid into an organic solvent, and carrying out esterification reaction by using an organic acid as a catalyst in the presence of a polymerization inhibitor and a reducer; and after the reaction finishes, carrying out salt washing, neutralization, water washing, drying and reduced pressure distillation to remove the solvent, thereby obtaining the 9.9-(4-thiophenyl-(methyl)acryloyloxypolyethoxy)bis fluorene. The polyethoxy acrylate resin containing bisthiophenyl fluorene structure is a colorless or light yellow transparent photocuring resin, has favorable heat resistance and transparency, and has different refractive index gradients.

The invention relates to a method for preparing a double-layer anti-reflection film for a silicon solar cell and belongs to the technical field of new energy materials. According to the method, a urethane acrylate modified SiO2 film is employed, the urethane acrylate has a urethane bond, the invention is characterized in that a plurality of hydrogen bonds can be formed between polymer molecular chains, the double-layer anti-reflection film has high wear resistance, adhesion, flexibility, high peel strength and excellent low-temperature resistance performance and the excellent optical performance and weather resistance of polyacrylate, a modified second layer anti-reflection film has excellent mechanical wear resistance and flexibility, and the breaking elongation is high. According to theinvention, the silver mirror reaction is used and the annealing treatment is combined, silver nanoparticles are prepared on the surface of a substrate to be a first layer anti-reflection film, the formation of the silver nanoparticles in random distribution is a result of the combined action of metal thermodynamics and kinetics, and when the rapid annealing is carried out, a silver film system acquires sufficient kinetic energy and tends to have nanoparticle structure with a small surface area.

The invention belongs to the technical field of laser and an optical fiber, and particularly relates to borosilicate glass and a preparation method and application thereof. The borosilicate glass in the invention is mainly prepared from the following raw materials in molar percentage: 38 to 60% of silicon dioxide, 2 to 10% of boron oxide, 10 to 35% of alkali metal oxide, 10 to 35% of alkaline earth metal oxide, 2 to 15% of intermediate oxide and 0.1 to 3% of rare earth oxide. The borosilicate glass has properties of capacity for high concentration rare earth doping and high devitrification (crystallization, phase splitting and the like) temperature, has a large difference value between the devitrification temperature and a softening temperature, is excellent in mechanical property and adjustable in refractive index and can be applied to a high-power solid laser and/or an optical fiber laser.

The invention relates to the technical field of passivation of a silicon solar battery and discloses a surface low-temperature passivation method for a solar battery. The method comprises the following steps: taking oxygen (O2) or a mixture of water vapor (H2O) and oxygen (O2) as a reaction source, adding a reactant for adjusting the refractive index of a passivation layer, adding a reactant for inhibiting dispersion of a doped substance in a nanostructure and an emitting electrode and finishing preparation of the reaction source; and placing the prepared nano-surface silicon solar battery sample with the nanostructure into a high-pressure reaction kettle, introducing the prepared reaction source into the high-pressure reaction kettle, heating after sealing, dispersing the high-concentration reaction source and allowing the high-concentration reaction source to enter the gap of the surface nanostructure of the nano-surface silicon solar battery, wherein the silicon oxide passivation layer formed by thermal oxidation is completely covered on the surface of the nano-surface silicon, and the nanostructure and the emitting electrode are completely wrapped by the silicon oxide passivation layer. Preparation of the silicon oxide passivation layer can be finished at low temperature, so damage to a prototype device by high temperature is avoided; and dopant is added into the reaction source conveniently, so the refractive index of the passivation layer can be adjusted.

The invention provides a polymer base functional film and a preparing method therefor. The functional film includes at least one layer of a polymer film, and at least one layer of the polymer film isa polymer film containing a nanometer cavity. Nanometer-sacrificial templates of different geometric structures are added into a polymer solution and the nanometer-sacrificial templates are selectively removed after film formation, thus forming a nanometer cavity structure in the polymer film. The effective refractive index of the polymer film can be flexibly changed, the matching between the filmand a device is realized, and the optoelectronic properties of the application device components are improved.

The invention relates to a PERC double-sided solar cell and a manufacturing method thereof. The solar cell is characterized by comprising a front electrode, a back electrode and a P-type silicon wafersubstrate, an N-type doping layer, a front silicon dioxide layer and a front silicon nitride layer are sequentially arranged on one surface of the P-type silicon wafer substrate from inside to outside, and a back aluminum oxide layer, a back silicon nitride layer and a back silicon dioxide layer are sequentially arranged on the other surface of the P-type silicon wafer substrate from inside to outside; the front electrode sequentially penetrates through the front silicon nitride layer and the front silicon dioxide layer; the front electrode is connected with the N-type doped layer; the back electrode sequentially penetrates through the back silicon dioxide layer, the back silicon nitride layer and the back aluminum oxide layer; and the back electrode is connected with the P-type silicon wafer substrate. The problems that black spots and black spots cannot be fundamentally eliminated, and the manufacturing cost of a silicon wafer is increased in the prior art are solved.

The invention provides an optical structure and a display substrate, belongs to the field of display technology, and solves the problems that a conventional OLED structure cannot meet the demands on both visual angle and light extraction rate. The optical structure comprises a first structural unit and a second structural unit which are alternately arranged, wherein the refractive indexes of both the first structural unit and the second structural unit are adjustable, so that the refractive indexes of the first structural unit and the second structural unit can be different.

The invention belongs to the technical field of chemical thin films, and particularly discloses a preparation method for a hydrophobic organic-modified silicate thin film with an adjustable refractive index. The method specifically comprises the following steps: (1) preparing an initial SiO2 sol coating solution, adding ethyl orthosilicate and absolute ethyl alcohol into the initial SiO2 sol coating solution, mixing and stirring the mixture, dropwise adding a mixed solution of the absolute ethyl alcohol, deionized water and ammonium hydroxide, and then stirring, standing and aging; (2) modifying the SiO2 sol coating solution through PMHS (Polymethyl Hydrogen Siloxane), namely, adding a certain amount of PMHS reagent into the aged stable SiO2 sol coating solution, adding a catalyst after stirring the solution uniformly, continuously performing sealed stirring and standing again after a reaction is completed; (3) preparing the hydrophobic thin film. The preparation method is easy to operate; the refractive index of the prepared thin film can be accurately controlled to change between 1.18 and 1.36; the thin film surface does not have a large amount of hydroxy residues; the hydrophobic thin film is directly formed; meanwhile, the service lifetime of the coating solution is greatly prolonged; the stability of the film solution is greatly improved.

The invention discloses a method for making a silica film on the surface of a quartz substrate. The method comprises the following steps: placing the quartz substrate on an objective table, carrying out an oxyhydrogen-flame high-temperature hydrolysis reaction to allow a lower cladding, a core layer and an upper cladding to respectively sequentially grow on the surface of the quartz substrate, selectively introducing SiCl4, H2, O2, GeCl4, BCl3 and POCl3 gases by an oxyhydrogen lance during the growth of each of the above layers, controlling the introduction amount of each of the above gases, the temperature of the objective table and the growth speed of each of the layers to obtain different thicknesses of the lower cladding, the core layer and the upper cladding, and respectively annealing the layers in a vacuum rapid annealing furnace under a controlled heating and cooling speed and controlled heat insulation time to obtain the silica film on the surface of the quartz substrate. The method overcomes the defects of traditional making methods, realizes the adjustability of the refractive index of the silica film, avoids the precipitation of silica crystals in the annealing process, and improves the film making efficiency and the film quality.

The invention provides a method for manufacturing an antireflection film for a solar battery. The photovoltaic efficiency of a solar panel is improved in a film coating and quantum dot adding mode. The antireflection film is manufactured through preparing a sol, and in addition, quantum dots are added during the sol preparation, so that partial short-wavelength light is converted to the visible light waveband, the available energy is increased, the photovoltaic efficiency of the solar panel is improved, and finally, a coater is used for film coating. The method provided by the invention has the advantages that a sol-gel film coating method is adopted for manufacturing the coated film, the equipment is simple, in addition, the operation is convenient, the operation can be carried out on substrates with irregular shapes or large dimensions, the cost is lower, and the industrial mass production is convenient.

The invention discloses a preparation method of a quantum dot patterned film. The preparation method at least comprises the following steps: (1) obtaining a film forming solution S1; (2) obtaining a solution S2 for patterning; (3) obtaining a film prepared from the film forming solution S1 on a substrate; (4) transferring the solution S2 to the pixel sites of the film in the step (3) to obtain thequantum dot patterned film, wherein the solution S2 contains a patterned solute, the patterned solute comprising at least one of quantum dots and a perovskite quantum dot precursor. The method is easy and convenient to operate, low in cost and suitable for industrial production, large-area quantum dot patterning can be achieved, and the patterned film prepared through the method can effectively isolate water and oxygen, is resistant to chemical corrosion and has high stability.