Trench gate charge storage type IGBT and manufacturing method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- UNIV OF ELECTRONIC SCI & TECH OF CHINA
- Publication Date
- 2018-08-28
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of power semiconductor devices, in particular to a trench gate charge storage type insulated gate bipolar transistor (CSTBT). Background technique
[0002] Insulated Gate Bipolar Transistor (IGBT) was proposed on the basis of research on power MOSFET, BJT and SCR / GTO, etc. In the late 1970s and early 1980s, it was invented by introducing a PN junction into the back substrate of the power MOSFET structure and achieve mass production. The conductance modulation effect introduced by the PN junction on the back of the device when the device is turned on makes the IGBT a new type of power electronic device that is composed of a MOS field effect transistor and a bipolar junction transistor (BJT), and can also be equivalent to a bipolar junction transistor (BJT). ) driven MOSFET structure. IGBT combines the characteristics of both MOSFET and BJT: not only has the advantages of high input impedance, low control po...