Method for carrying out surface treatment on OLED manufacturing equipment
A technology for manufacturing equipment and surface treatment, which is applied in the field of OLED manufacturing equipment, can solve problems such as the inability to change the adsorption performance of metal surfaces, achieve the effects of improving adsorption or anti-adsorption performance, increasing the duration of the process, and avoiding serious consequences.
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Embodiment 1
[0053] This embodiment is an OLED evaporation equipment, the inner surface of the vacuum chamber of the OLED evaporation equipment has a first coating;
[0054] The outer surface of the stainless steel device (that is, the parts closer to the substrate and the source) of the OLED evaporation equipment has a second coating;
[0055] The contact angle of the first coating is 102°, and the surface free energy is 13mJ / m 2 ;
[0056] The contact angle of the second coating is 65°, and the surface free energy is 40mJ / m 2 .
[0057] The processing method of above-mentioned OLED evaporation equipment, comprises the following steps:
[0058] Step 1, use trichlorethylene to wipe the inner surface of the vacuum chamber and the outer surface of the stainless steel device, and then ultrasonically clean them in isopropanol and deionized aqueous solution for 10 minutes, wherein the volume ratio of the isopropanol to deionized water is 1:19;
[0059] Step 2. Soak the pretreated inner sur...
Embodiment 2
[0065] This embodiment is an OLED evaporation equipment, the inner surface of the vacuum chamber of the OLED evaporation equipment has a first coating;
[0066] The surface of the stainless steel device of the OLED evaporation equipment has a second coating;
[0067] The contact angle of the first coating is 105°, and the surface free energy is 17mJ / m 2 ;
[0068] The contact angle of the second coating is 70°, and the surface free energy is 35mJ / m 2 .
[0069] The treatment method of the above-mentioned OLED evaporation equipment is basically the same as that of Example 1, the only difference being that C 3 N 3 S 2 HK—N(C 6 h 13 ) 2 The volume ratio with sodium hydroxide solution is 3.2:1; C 3 N 3 S 2 The volume ratio of HK-SH to sodium hydroxide solution is 2.8:1.
Embodiment 3
[0071] This embodiment is an OLED evaporation fixture; the surface of the OLED evaporation fixture has a coating;
[0072] Coating contact angle is 110°, surface free energy is 20mJ / m 2 .
[0073] The processing method of the above-mentioned OLED evaporation fixture comprises the following steps:
[0074] Step 1. Wipe the outer surface of the OLED evaporation fixture with trichlorethylene, and then ultrasonically clean it in isopropanol and deionized aqueous solution for 10 minutes, wherein the volume ratio of isopropanol to deionized water is 1:19;
[0075] Step 2. Soak the outer surface of the pretreated OLED evaporation fixture in HCl and HNO 3 etched in the mixed solution for 25s, wherein the mass concentration of HCl in the mixed solution is 4g / L, and the HNO 3 The mass concentration is 3g / L;
[0076] Rinse the surface of the etched OLED evaporation fixture with deionized water, and then ultrasonically clean it in deionized water for 1 min;
[0077] Step 3, using tri...
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